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1. (WO2018196193) ARRAY SUBSTRATE, MANUFACTURING METHOD THEREFOR AND DISPLAY PANEL
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Pub. No.: WO/2018/196193 International Application No.: PCT/CN2017/094548
Publication Date: 01.11.2018 International Filing Date: 26.07.2017
IPC:
H01L 27/12 (2006.01) ,H01L 21/77 (2017.01) ,G02F 1/1343 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
27
Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
02
including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
12
the substrate being other than a semiconductor body, e.g. an insulating body
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
70
Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in or on a common substrate or of specific parts thereof; Manufacture of integrated circuit devices or of specific parts thereof
77
Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
G PHYSICS
02
OPTICS
F
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1
Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01
for the control of the intensity, phase, polarisation or colour
13
based on liquid crystals, e.g. single liquid crystal display cells
133
Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
1333
Constructional arrangements
1343
Electrodes
Applicants:
惠科股份有限公司 HKC CORPORATION LIMITED [CN/CN]; 中国广东省深圳市 宝安区石岩街道水田村民营工业园惠科工业园厂房1、2、3栋,九州阳光1号厂房5、7楼 5th and 7th Floor of Factory Building 1, Jiuzhou Yangguang Factory Buildings 1, 2, 3 of HKC Industrial Park, Privately Operated Industrial Park Shuitian Village, Shiyan Sub-district, Baoan District Shenzhen, Guangdong 518108, CN
重庆惠科金渝光电科技有限公司 CHONGQING HKC OPTOELECTRONICS TECHNOLOGY CO., LTD. [CN/CN]; 中国重庆市 巴南区界石镇石景路1号 No. 1 Shijing Rd., Jieshi, Banan District Chongqing 401320, CN
Inventors:
陈猷仁 CHEN, Yu-jen; CN
Agent:
北京品源专利代理有限公司 BEYOND ATTORNEYS AT LAW; 中国北京市 海淀区莲花池东路39号西金大厦6层 F6, Xijin Centre 39 Lianhuachi East Rd., Haidian District Beijing 100036, CN
Priority Data:
201710270695.924.04.2017CN
Title (EN) ARRAY SUBSTRATE, MANUFACTURING METHOD THEREFOR AND DISPLAY PANEL
(FR) SUBSTRAT DE RÉSEAU, SON PROCÉDÉ DE FABRICATION, ET PANNEAU D'AFFICHAGE
(ZH) 阵列基板及其制造方法、显示面板
Abstract:
(EN) An active switch array substrate, a manufacturing method therefor and a display panel. The manufacturing method comprises: forming, on a substrate, a gate electrode of an active switch, an insulating layer, an active layer and an ohmic contact layer; forming, on the ohmic contact layer and the insulating layer, a source and a drain of the active switch; depositing a protective layer on the source, the drain and the insulating layer; depositing a color filter layer on the protective layer and performing exposure and development; depositing, on the color filter layer and the protective layer, a photoresist layer that can be transmitted through by visible light; and directly depositing a transparent conductive layer on the photoresist layer, and etching the transparent conductive layer, so as to form a pixel electrode layer.
(FR) La présente invention concerne un substrat de réseau de commutateur actif, son procédé de fabrication, et un panneau d’affichage. Le procédé de fabrication consiste à : former, sur un substrat, une électrode de grille d'un commutateur actif, une couche d'isolation, une couche active et une couche de contact ohmique; former, sur la couche de contact ohmique et la couche d'isolation, une source et un drain du commutateur actif; déposer une couche de protection sur la source, le drain et la couche d'isolation; déposer une couche de filtre coloré sur la couche protectrice et réaliser l'exposition et le développement; déposer, sur la couche de filtre coloré et la couche protectrice, une couche de résine photosensible qui peut être transmise à travers la lumière visible; et déposer directement une couche conductrice transparente sur la couche de résine photosensible, et graver la couche conductrice transparente, de manière à former une couche d'électrode de pixel.
(ZH) 一种主动开关阵列基板及其制造方法、显示面板,其中制造方法包括,在一基板上形成主动开关的栅极、绝缘层、主动层以及欧姆接触层;于所述欧姆接触层以及所述绝缘层上形成所述主动开关的源极与漏极;于所述源极、漏极以及所述绝缘层上沉积一保护层;于所述保护层上沉积一彩色滤光层并进行曝光及显影;于所述彩色滤光层及保护层上沉积一层可被可见光穿透过的光刻胶层;于所述光刻胶层上直接沉积一透明导电层,并蚀刻所述透明导电层,以形成像素电极层。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)