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1. (WO2018196078) ARRAY SUBSTRATE, MANUFACTURING METHOD THEREFOR AND DISPLAY DEVICE
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Pub. No.: WO/2018/196078 International Application No.: PCT/CN2017/085870
Publication Date: 01.11.2018 International Filing Date: 25.05.2017
IPC:
H01L 27/32 (2006.01) ,H01L 51/56 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
27
Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
28
including components using organic materials as the active part, or using a combination of organic materials with other materials as the active part
32
with components specially adapted for light emission, e.g. flat-panel displays using organic light-emitting diodes
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50
specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
56
Processes or apparatus specially adapted for the manufacture or treatment of such devices or of parts thereof
Applicants:
深圳市华星光电半导体显示技术有限公司 SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD. [CN/CN]; 中国广东省深圳市 光明新区公明街道塘明大道9-2号 No.9-2, Tangming Road, Gongming Street, Guangming New District Shenzhen, Guangdong 518132, CN
Inventors:
韩佰祥 HAN, Baixiang; CN
Agent:
深圳市威世博知识产权代理事务所(普通合伙) CHINA WISPRO INTELLECTUAL PROPERTY LLP.; 中国广东省深圳市 南山区高新区粤兴三道8号中国地质大学产学研基地中地大楼A806 Room A806, Zhongdi Building China University of Geosciences Base No.8 Yuexing 3rd Road, High-Tech Industrial Estate Nanshan District, Shenzhen, Guangdong 518057, CN
Priority Data:
201710271282.224.04.2017CN
Title (EN) ARRAY SUBSTRATE, MANUFACTURING METHOD THEREFOR AND DISPLAY DEVICE
(FR) SUBSTRAT DE RÉSEAU, PROCÉDÉ DE FABRICATION DE CELUI-CI ET DISPOSITIF D'AFFICHAGE
(ZH) 阵列基板及制造方法、显示装置
Abstract:
(EN) Provided are an array substrate, a manufacturing method therefor and a display device. The method comprises: preparing a laminated structure (12) and an anode layer (13) on a base substrate (11) in sequence; preparing, on the laminated structure (12) and the anode layer (13), a photoresist layer (14) having an accommodating cavity (A) and a recessed structure (B) ; preparing an organic light-emitting device (15) in the accommodating cavity (A); and preparing a reflection cathode layer (16) on the organic light-emitting device (15) and the photoresist layer (14). The present invention can avoid leakage of light caused by the reflection cathode layer, improving the display quality of the panel.
(FR) L'invention concerne un substrat de réseau, son procédé de fabrication et un dispositif d'affichage. Le procédé comprend : la préparation d'une structure stratifiée (12) et d'une couche d'anode (13) sur un substrat de base (11) en séquence ; la préparation, sur la structure stratifiée (12) et la couche d'anode (13), d'une couche de résine photosensible (14) ayant une cavité de réception (A) et une structure évidée (B) ; la préparation d'un dispositif électroluminescent organique (15) dans la cavité de réception (A) ; et la préparation d'une couche de cathode de réflexion (16) sur le dispositif électroluminescent organique (15) et la couche de résine photosensible (14). La présente invention peut éviter une fuite de lumière provoquée par la couche de cathode de réflexion, améliorant la qualité d'affichage du panneau.
(ZH) 提供了一种阵列基板及制造方法、显示装置。其中,方法包括:在衬底基板(11)上依次制备一层叠结构(12)及阳极层(13);在层叠结构(12)及阳极层(13)上制备具有容置腔(A)及凹陷结构(B)的光阻层(14);在容置腔(A)内制备有机发光器件(15);在有机发光器件(15)及光阻层(14)上制备反射阴极层(16)。能够避免由反射阴极层引起的漏光现象,提升面板显示品质。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)