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1. (WO2018196060) MICROSTRUCTURE SUBSTRATE AND METHOD FOR MANUFACTURING SAME, AND DISPLAY DEVICE

Pub. No.:    WO/2018/196060    International Application No.:    PCT/CN2017/085087
Publication Date: Fri Nov 02 00:59:59 CET 2018 International Filing Date: Sat May 20 01:59:59 CEST 2017
IPC: G02B 5/02
G02B 1/18
Applicants: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD
武汉华星光电技术有限公司
Inventors: YANG, Yong
杨勇
Title: MICROSTRUCTURE SUBSTRATE AND METHOD FOR MANUFACTURING SAME, AND DISPLAY DEVICE
Abstract:
Provided are a microstructure substrate and a method for manufacturing same, and a display device. The method comprises: coating a substrate base (11) with a fingerprint resistant film layer (12); sputtering a silicon dioxide layer (13) on the fingerprint resistant film layer (12); and etching the silicon dioxide layer (13) so as to fabricate the silicon dioxide layer (13) having multiple arc recess microstructures. The present invention can improve the influence of a microstructure on the picture quality of a high resolution panel, and reduce the blurriness of the picture, so that it is possible that the base is applied to the high resolution panel.