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1. (WO2018190090) CLEANING WATER SUPPLY DEVICE
Latest bibliographic data on file with the International BureauSubmit observation

Pub. No.: WO/2018/190090 International Application No.: PCT/JP2018/011101
Publication Date: 18.10.2018 International Filing Date: 20.03.2018
IPC:
H01L 21/304 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
04
the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
18
the devices having semiconductor bodies comprising elements of the fourth group of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
30
Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20-H01L21/26142
302
to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
304
Mechanical treatment, e.g. grinding, polishing, cutting
Applicants:
栗田工業株式会社 KURITA WATER INDUSTRIES LTD. [JP/JP]; 東京都中野区中野四丁目10番1号 10-1, Nakano 4-chome, Nakano-ku, Tokyo 1640001, JP
Inventors:
森田 博志 MORITA, Hiroshi; JP
顔 暢子 GAN, Nobuko; JP
Agent:
重野 剛 SHIGENO, Tsuyoshi; JP
重野 隆之 SHIGENO, Takayuki; JP
Priority Data:
2017-08062714.04.2017JP
Title (EN) CLEANING WATER SUPPLY DEVICE
(FR) DISPOSITIF D'ALIMENTATION EN EAU DE NETTOYAGE
(JA) 洗浄水供給装置
Abstract:
(EN) This cleaning water supply device is provided with: an ultrapure water line 1 through which a fixed amount of ultrapure water flows; a production unit 2 which adds a fixed amount of a solute into the ultrapure water line to produce a cleaning water; a storage tank 4 for the cleaning water; cleaning machines 5A-5N to which the cleaning water is supplied from the storage tank 4; and a controller 2a which controls the cleaning water production unit 2 such that the water level in the storage tank 4 is in a prescribed range.
(FR) La présente invention concerne un dispositif d'alimentation en eau de nettoyage pourvu : d'une conduite d'eau ultra-pure 1 à travers laquelle s'écoule une quantité fixe d'eau ultra-pure ; d'une unité de production 2 qui ajoute une quantité fixe d'un soluté dans la conduite d'eau ultra-pure pour produire une eau de nettoyage ; d'un réservoir de stockage 4 de l'eau de nettoyage ; de machines de nettoyage 5A-5N auxquelles l'eau de nettoyage est fournie depuis le réservoir de stockage 4 ; et d'un dispositif de régulation 2a qui régule l'unité de production d'eau de nettoyage 2 de sorte que le niveau d'eau dans le réservoir de stockage 4 s'inscrive dans une plage prescrite.
(JA) 洗浄水供給装置は、超純水が定量にて流れる超純水ライン1と、該超純水ラインに溶質を定量添加して洗浄水を製造する製造部2と、洗浄水の貯留槽4と、貯留槽4から洗浄水が供給される洗浄機5A~5Nと、貯留槽4内の水位が所定範囲となるように洗浄水製造部2を制御する制御器2aとを有する。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)