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1. (WO2018189906) PRODUCTION METHOD AND PRODUCTION DEVICE FOR ORGANIC EL DISPLAY DEVICE
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2018/189906 International Application No.: PCT/JP2017/015381
Publication Date: 18.10.2018 International Filing Date: 14.04.2017
IPC:
H05B 33/10 (2006.01) ,C23C 14/24 (2006.01) ,H01L 27/32 (2006.01) ,H01L 51/50 (2006.01)
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
B
ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
33
Electroluminescent light sources
10
Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
24
Vacuum evaporation
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
27
Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
28
including components using organic materials as the active part, or using a combination of organic materials with other materials as the active part
32
with components specially adapted for light emission, e.g. flat-panel displays using organic light-emitting diodes
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50
specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
Applicants:
堺ディスプレイプロダクト株式会社 SAKAI DISPLAY PRODUCTS CORPORATION [JP/JP]; 大阪府堺市堺区匠町1番地 1, Takumicho, Sakai-ku, Sakai-shi, Osaka 5908522, JP
Inventors:
岸本 克彦 KISHIMOTO, Katsuhiko; JP
Agent:
特許業務法人朝日奈特許事務所 ASAHINA & CO.; 大阪府大阪市中央区谷町二丁目2番22号 NSビル NS Building, 2-22, Tanimachi 2-chome, Chuo-ku, Osaka-shi, Osaka 5400012, JP
Priority Data:
Title (EN) PRODUCTION METHOD AND PRODUCTION DEVICE FOR ORGANIC EL DISPLAY DEVICE
(FR) PROCÉDÉ DE PRODUCTION ET DISPOSITIF DE PRODUCTION DE DISPOSITIF D'AFFICHAGE ÉLECTROLUMINESCENT ORGANIQUE
(JA) 有機EL表示装置の製造方法及び製造装置
Abstract:
(EN) According to one embodiment, the production method for an organic EL display device involves performing a reforming treatment on a vapor deposition mask at a surface thereof that faces a vapor deposition source (S2), mounting a support substrate on one surface of the vapor deposition mask (S3), spattering a desired organic material at the vapor deposition mask so as to form an organic layer that comprises a plurality of layers at a desired location on the support substrate (S4), and forming a second electrode on the organic layer (S8). Before the formation of the organic layer that comprises a plurality of layers, before or after the formation of each of the layers of the organic layer that comprises a plurality of layers, and/or before the formation of the second electrode, an exposed surface of the vapor deposition mask or an exposed surface of the organic layer that has been formed on the vapor deposition mask is reformed.
(FR) Selon un mode de réalisation, le procédé de production d'un dispositif d'affichage électroluminescent organique consiste à réaliser un traitement de reformage sur un masque de dépôt en phase vapeur au niveau d'une surface de celui-ci qui fait face à une source de dépôt en phase vapeur (S2), à monter un substrat de support sur une surface du masque de dépôt en phase vapeur (S3), à projeter un matériau organique souhaité au niveau du masque de dépôt en phase vapeur de manière à former une couche organique qui comprend une pluralité de couches à un emplacement souhaité sur le substrat de support (S4), et à former une seconde électrode sur la couche organique (S8). Avant la formation de la couche organique qui comprend une pluralité de couches, avant ou après la formation de chacune des couches de la couche organique qui comprend une pluralité de couches, et/ou avant la formation de la seconde électrode, une surface exposée du masque de dépôt en phase vapeur ou une surface exposée de la couche organique qui a été formée sur le masque de dépôt en phase vapeur est reformée.
(JA) 一実施形態の有機EL表示装置の製造方法は、蒸着源と対向する面に改質処理が施された(S2)蒸着マスクの一面に支持基板が装着され(S3)、蒸着マスクに向かって所望の有機材料を飛散させることで支持基板の所望の場所に複数層からなる有機層が積層され(S4)、有機層の上に第2電極が形成される(S8)。そして、複数層からなる有機層の積層の前、複数層からなる有機層の各有機層の積層の前又は後、及び前記第2電極の形成の前の少なくとも1つのタイミングで、蒸着マスクの露出面又は蒸着マスクに形成された有機層の露出面が改質される。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)