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1. (WO2018186005) ETCHING LIQUID COMPOSITION AND ETCHING METHOD

Pub. No.:    WO/2018/186005    International Application No.:    PCT/JP2018/002524
Publication Date: Fri Oct 12 01:59:59 CEST 2018 International Filing Date: Sat Jan 27 00:59:59 CET 2018
IPC: C23F 1/28
Applicants: ADEKA CORPORATION
株式会社ADEKA
Inventors: IKEDA Takashige
池田 貴重
KABEYA Ryoji
壁矢 良次
OHBA Mitsunori
大庭 三典
Title: ETCHING LIQUID COMPOSITION AND ETCHING METHOD
Abstract:
Provided is an etching liquid composition for etching a nickel-containing layer, whereby a smooth layer surface after etching can be obtained, a large level difference between layers is not prone to occur even when a layered body of a nickel-containing layer and a metal-based layer is etched at once. The present invention is an etching liquid composition for etching a nickel-containing layer. An aqueous solution containing: (A) 0.1-20 mass% in terms of iron(II) ion concentration of an iron(II) ion component; (B) 0.01-20 mass% of hydrogen chloride; and (C) 0.01-5 mass% of at least one species selected from the group consisting of 5-aminotetrazole, benzothiazole, and benzotriazole.