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1. (WO2018184783) LITHOGRAPHIC METHOD AND APPARATUS
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Pub. No.: WO/2018/184783 International Application No.: PCT/EP2018/055446
Publication Date: 11.10.2018 International Filing Date: 06.03.2018
IPC:
G03F 7/20 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
Inventors:
KANT, Nick; NL
VAN HERPEN, Robertus, Martinus, Alphonsus; NL
BEKS, Mark, Louwrens; NL
SWAENEN, Lense, Hendrik-Jan, Maria; NL
VANROOSE, Nico; NL
DOWNES, James, Robert; NL
Agent:
PJANOVIC, Ilija; NL
Priority Data:
17165195.306.04.2017EP
Title (EN) LITHOGRAPHIC METHOD AND APPARATUS
(FR) PROCÉDÉ ET APPAREIL LITHOGRAPHIQUES
Abstract:
(EN) A method of reducing an aberration arising during operation of a lithographic apparatus, the method comprising measuring the aberration to obtain an aberration signal, the aberration signal comprising a first component and a second component, wherein the first component of the aberration signal comprises a first frequency band and the second component of the aberration signal comprises a second frequency band, wherein the first frequency band comprises frequencies that are higher than frequencies comprised in the second frequency band, calculating a correction, wherein a first part of the correction is calculated based on the first component of the aberration signal, and applying the correction to the lithographic apparatus.
(FR) La présente invention concerne un procédé de réduction d'une aberration survenant pendant le fonctionnement d'un appareil lithographique, le procédé comprenant la mesure de l'aberration pour obtenir un signal d'aberration, le signal d'aberration comprenant une première composante et une deuxième composante, la première composante du signal d'aberration comprenant une première bande de fréquence et la deuxième composante du signal d'aberration comprenant une deuxième bande de fréquence, la première bande de fréquence comprenant des fréquences qui sont supérieures aux fréquences comprises dans la deuxième bande de fréquence, le calcul d'une correction, une première partie de la correction étant calculée sur la base de la première composante du signal d'aberration, et l'application de la correction à l'appareil lithographique.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)