Search International and National Patent Collections

1. (WO2018184375) LIGHT DIFFRACTION DEVICE, PREPARATION METHOD THEREFOR, AND 3D DISPLAY APPARATUS

Pub. No.:    WO/2018/184375    International Application No.:    PCT/CN2017/106807
Publication Date: Fri Oct 12 01:59:59 CEST 2018 International Filing Date: Fri Oct 20 01:59:59 CEST 2017
IPC: G02B 27/42
G02B 27/46
G02B 27/22
G03F 7/20
Applicants: SVG OPTRONICS, CO., LTD
苏州苏大维格光电科技股份有限公司
SOOCHOW UNIVERSITY
苏州大学
Inventors: SHAO, Renjin
邵仁锦
PU, Donglin
浦东林
ZHU, Pengfei
朱鹏飞
ZHANG, Jin
张瑾
ZHU, Ming
朱鸣
CHEN, Linsen
陈林森
Title: LIGHT DIFFRACTION DEVICE, PREPARATION METHOD THEREFOR, AND 3D DISPLAY APPARATUS
Abstract:
A nano-scale structured light diffraction device based on random laser speckle, the diffractive structured unit being only a few hundred nanometres or even tens of nanometres, having the advantages of a high resolution, a high contrast ratio, and a large field of view angle. The preparation method for the nano-scale structured diffraction device is a phase light field interference photolithography method and can prepare a high-quality depth-sensing structured light diffraction device. Compared to machining techniques for traditional optical elements, phase light field interference photolithography has the advantages of high resolution and high phase matching precision and, compared to photolithography techniques such as ultraviolet projection exposure and electron beam direct writing, has the advantages of being high-speed and low-cost.