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|1. (WO2018184375) LIGHT DIFFRACTION DEVICE, PREPARATION METHOD THEREFOR, AND 3D DISPLAY APPARATUS|
|Applicants:||SVG OPTRONICS, CO., LTD
|Title:||LIGHT DIFFRACTION DEVICE, PREPARATION METHOD THEREFOR, AND 3D DISPLAY APPARATUS|
A nano-scale structured light diffraction device based on random laser speckle, the diffractive structured unit being only a few hundred nanometres or even tens of nanometres, having the advantages of a high resolution, a high contrast ratio, and a large field of view angle. The preparation method for the nano-scale structured diffraction device is a phase light field interference photolithography method and can prepare a high-quality depth-sensing structured light diffraction device. Compared to machining techniques for traditional optical elements, phase light field interference photolithography has the advantages of high resolution and high phase matching precision and, compared to photolithography techniques such as ultraviolet projection exposure and electron beam direct writing, has the advantages of being high-speed and low-cost.