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1. (WO2018183245) MATERIAL DEPOSITION PREVENTION ON A WORKPIECE IN A PROCESS CHAMBER

Pub. No.:    WO/2018/183245    International Application No.:    PCT/US2018/024445
Publication Date: Fri Oct 05 01:59:59 CEST 2018 International Filing Date: Wed Mar 28 01:59:59 CEST 2018
IPC: H01J 37/32
Applicants: MATTSON TECHNOLOGY, INC.
Inventors: CUE, Jeffrey
ZUCKER, Martin L.
Title: MATERIAL DEPOSITION PREVENTION ON A WORKPIECE IN A PROCESS CHAMBER
Abstract:
Focus ring assemblies for plasma processing apparatus are provided. In one example implementation, an apparatus includes a plasma source configured to generate a plasma. The apparatus includes a chamber configured to receive a workpiece. The apparatus includes a workpiece support contained in the chamber and configured to support the workpiece. The apparatus includes a focus ring assembly. The focus ring assembly includes a focus ring having an upper tier and a lower tier. An inner edge of the upper tier can be separated a lateral distance of at least about 3 mm from an outer edge of the workpiece located on the workpiece support.