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1. (WO2018182717) COLORED SELF-ALIGNED SUBTRACTIVE PATTERNING

Pub. No.:    WO/2018/182717    International Application No.:    PCT/US2017/025509
Publication Date: Fri Oct 05 01:59:59 CEST 2018 International Filing Date: Sat Apr 01 01:59:59 CEST 2017
IPC: H01L 21/768
Applicants: INTEL CORPORATION
Inventors: LIN, Kevin
HOURANI, Rami
TAN, Elliot, N.
CHANDHOK, Manish
JAHAGIRDAR, Anant H.
BRISTOL, Robert, L.
SCHENKER, Richard, E.
LILAK, Aaron Douglas
Title: COLORED SELF-ALIGNED SUBTRACTIVE PATTERNING
Abstract:
A computing device including tight pitch features and a method of fabricating a computing device using colored spacer formation is disclosed. The computing device includes a memory and an integrated circuit coupled to the memory. The integrated circuit includes a first multitude of features above a substrate. The integrated circuit die includes a second multitude of features above the substrate. The first multitude of features and the second multitude of features are same features disposed in a first direction. The first multitude of features interleave with the second multitude of features. The first multitude of features has a first size and the second multitude of features has a second size.