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Pub. No.:    WO/2018/182504    International Application No.:    PCT/SG2017/050181
Publication Date: Fri Oct 05 01:59:59 CEST 2018 International Filing Date: Sat Apr 01 01:59:59 CEST 2017
IPC: H01L 21/02
Applicants: NEITAS PTE. LTD.
Inventors: YOSHIDA, Masataka
DEGUCHI, Yasunori
An object is to provide a method of efficiently manufacturing microdevice with a small investment under an environment in which dust prevention measures are performed. Under an environment where n (n is an arbitrary integer value equal to or more than two) microdevice manufacturing devices perform processing in predetermined one or more steps among a plurality of steps for manufacturing a predetermined type of microdevice having a substrate of a predetermined size as one unit, a transport device (4) transports, in the n microdevice manufacturing devices, from a first microdevice manufacturing device that completes the performance of processing on a predetermined unit to a second microdevice manufacturing device that can perform processing in the subsequent step, the predetermined unit. A clean tunnel (6) shields the transport portion from an outside unclean portion such that the predetermined unit is transported in a clean portion.