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1. (WO2018181985) PATTERN CALCULATION APPARATUS, PATTERN CALCULATION METHOD, MASK, EXPOSURE APPARATUS, DEVICE PRODUCTION METHOD, COMPUTER PROGRAM, AND RECORDING MEDIUM

Pub. No.:    WO/2018/181985    International Application No.:    PCT/JP2018/013852
Publication Date: Fri Oct 05 01:59:59 CEST 2018 International Filing Date: Sat Mar 31 01:59:59 CEST 2018
IPC: G03F 1/70
G03F 7/20
Applicants: NIKON CORPORATION
株式会社ニコン
Inventors: KATO, Masaki
加藤 正紀
TOGUCHI, Manabu
戸口 学
Title: PATTERN CALCULATION APPARATUS, PATTERN CALCULATION METHOD, MASK, EXPOSURE APPARATUS, DEVICE PRODUCTION METHOD, COMPUTER PROGRAM, AND RECORDING MEDIUM
Abstract:
A pattern calculation apparatus (2) calculates a mask pattern (1311d) formed on a mask (131) for forming, on a substrate (151) using exposure light (EL), a device pattern in which a plurality of unit device pattern sections (1511u) are arranged. The pattern calculation apparatus calculates unit mask pattern sections (1311u) for forming one unit device pattern section, calculates a mask pattern by arranging a plurality of calculated unit mask pattern sections, and when calculating the unit mask pattern sections, calculates the unit mask pattern sections assuming that a specific mask pattern section (1311n) corresponding to at least a portion of the unit mask pattern sections is adjacent to the unit mask pattern sections.