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1. (WO2018181468) METHACRYLIC RESIN COMPOSITION
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Pub. No.: WO/2018/181468 International Application No.: PCT/JP2018/012732
Publication Date: 04.10.2018 International Filing Date: 28.03.2018
IPC:
C08L 33/10 (2006.01) ,B32B 27/18 (2006.01) ,B32B 27/30 (2006.01) ,C08K 3/36 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
33
Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Compositions of derivatives of such polymers
04
Homopolymers or copolymers of esters
06
of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
10
Homopolymers or copolymers of methacrylic acid esters
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
27
Layered products essentially comprising synthetic resin
18
characterised by the use of special additives
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
27
Layered products essentially comprising synthetic resin
30
comprising vinyl resin; comprising acrylic resin
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
K
USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES AS COMPOUNDING INGREDIENTS
3
Use of inorganic ingredients
34
Silicon-containing compounds
36
Silica
Applicants: SUMITOMO CHEMICAL COMPANY, LIMITED[JP/JP]; 27-1, Shinkawa 2-chome, Chuo-ku, Tokyo 1048260, JP
Inventors: SUMIDA, Masakazu; JP
YAMAZAKI, Kazuhiro; JP
Agent: SAMEJIMA, Mutsumi; JP
YOSHIDA, Tamaki; JP
Priority Data:
2017-07021131.03.2017JP
Title (EN) METHACRYLIC RESIN COMPOSITION
(FR) COMPOSITION DE RÉSINE MÉTHACRYLIQUE
(JA) メタクリル樹脂組成物
Abstract:
(EN) The present invention provides a methacrylic resin composition satisfying formula (1) that contains a methacrylic resin and silica particles having a mean primary particle size of between 0.2 μm and 2 μm inclusive. 0.005
(FR) La présente invention concerne une composition de résine méthacrylique conforme à la formule (1) et qui contient une résine méthacrylique et des particules de silice présentant une taille de particule primaire moyenne comprise entre 0,2 µm et 2 µm (bornes incluses). 0,005 < y ≤ -0,07x + 0,17 formule (1) (dans la formule (1), x représente une valeur numérique pour le diamètre moyen de particule primaire de la particule de silice, exprimé en ajoutant l'unité « μm », et y représente une valeur numérique correspondant à la teneur en particules de silice, exprimée en ajoutant l'unité « % en poids », par rapport à 100 % en poids de la quantité totale de résine méthacrylique et de particules de silice.)
(JA) 本発明は、メタクリル樹脂と、平均一次粒子径0.2μm以上2μm以下のシリカ粒子とを含有し、下記式(1)を満足する、メタクリル樹脂組成物を提供する。 0.005<y≦-0.07x+0.17 式(1) (上記式(1)において、xは、単位「μm」を付して表された前記シリカ粒子の平均一次粒子径の数値を表し、yは、前記メタクリル樹脂と前記シリカ粒子との合計量100重量%に対する、単位「重量%」を付して表された前記シリカ粒子の含有量の数値を表す。)
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)