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1. (WO2018181209) PHOTOSENSITIVE ELEMENT AND PHOTOSENSITIVE ELEMENT ROLL
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Pub. No.: WO/2018/181209 International Application No.: PCT/JP2018/012196
Publication Date: 04.10.2018 International Filing Date: 26.03.2018
IPC:
G03F 7/09 (2006.01) ,G03F 7/004 (2006.01) ,G06F 3/041 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
09
characterised by structural details, e.g. supports, auxiliary layers
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
G PHYSICS
06
COMPUTING; CALCULATING; COUNTING
F
ELECTRIC DIGITAL DATA PROCESSING
3
Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
01
Input arrangements or combined input and output arrangements for interaction between user and computer
03
Arrangements for converting the position or the displacement of a member into a coded form
041
Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
Applicants: HITACHI CHEMICAL COMPANY, LTD.[JP/JP]; 9-2, Marunouchi 1-chome, Chiyoda-ku, Tokyo 1006606, JP
Inventors: YOSHIDA Hideki; JP
MUKAI Ikuo; JP
Agent: HASEGAWA Yoshiki; JP
SHIMIZU Yoshinori; JP
HIRANO Hiroyuki; JP
Priority Data:
PCT/JP2017/01369831.03.2017JP
Title (EN) PHOTOSENSITIVE ELEMENT AND PHOTOSENSITIVE ELEMENT ROLL
(FR) ÉLÉMENT PHOTOSENSIBLE ET ROULEAU D'ÉLÉMENT PHOTOSENSIBLE
(JA) 感光性エレメント及び感光性エレメントロール
Abstract:
(EN) This photosensitive element is provided with: a support film; and a photosensitive resin layer that is arranged on one surface of the support film. With respect to the other surface of the support film, the density of broken bubble marks is 30 marks/0.25 m2 or less; and the diameters of the broken bubble marks are from 40 μm to 100 μm (inclusive).
(FR) Cet élément photosensible est pourvu: d'un film de support; et d'une couche de résine photosensible qui est disposée sur une surface du film de support. Par rapport à l'autre surface du film de support, la densité de marques de bulles brisées est de 30 marques/0,25 m2 ou moins; et les diamètres des marques de bulles brisées sont de 40 µm à 100 µm (inclus).
(JA) 感光性エレメントは、支持フィルムと、支持フィルムの一方面に設けられた感光性樹脂層と、を備える。支持フィルムの他方面において、破泡痕の密度は、30個/0.25m以下であり、かつ、破泡痕の径は、40μm以上100μm以下である。
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)