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1. (WO2018181068) RESIN DISPERSION COMPOSITION
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Pub. No.: WO/2018/181068 International Application No.: PCT/JP2018/011918
Publication Date: 04.10.2018 International Filing Date: 23.03.2018
IPC:
C08L 53/00 (2006.01) ,C08F 293/00 (2006.01) ,C08K 3/20 (2006.01) ,C08K 5/00 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
53
Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
293
Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
K
USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES AS COMPOUNDING INGREDIENTS
3
Use of inorganic ingredients
18
Oxygen-containing compounds, e.g. metal carbonyls
20
Oxides; Hydroxides
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
K
USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES AS COMPOUNDING INGREDIENTS
5
Use of organic ingredients
Applicants: NIPPON PAPER INDUSTRIES CO., LTD.[JP/JP]; 4-1, Oji 1-chome, Kita-ku, Tokyo 1140002, JP
Inventors: TAKATA, Yuu; JP
SEKIGUCHI, Shunji; JP
YADA, Minoru; JP
Agent: SAKAI INTERNATIONAL PATENT OFFICE; Toranomon Mitsui Building, 8-1, Kasumigaseki 3-chome, Chiyoda-ku, Tokyo 1000013, JP
Priority Data:
2017-06384728.03.2017JP
Title (EN) RESIN DISPERSION COMPOSITION
(FR) COMPOSITION DE DISPERSION DE RÉSINE
(JA) 分散樹脂組成物
Abstract:
(EN) The present invention addresses the problem of providing an olefin-based resin dispersion composition which is excellent in terms of dispersibility, chemical resistance, and adhesiveness. The resin dispersion composition comprises: a block copolymer (C) having an acid value of 5-150 mg-KOH/g and comprising a polymer block (A) that mainly comprises a structural unit derived from an olefin monomer and a polymer block (B) that comprises a structural unit derived from a vinyl monomer having a carboxyl group or carboxylic anhydride group and a structural unit derived from a vinyl monomer copolymerizable with said vinyl monomer; and a dispersion medium.
(FR) L'invention aborde le problème consistant à fournir une composition de dispersion de résine à base d’oléfine qui possède d'excellentes propriétés en termes de dispersibilité, de résistance chimique et d’adhésivité. La composition de dispersion de résine comprend : un copolymère séquencé (C) ayant une valeur acide de 5 à 150 mg-KOH/g et comprenant un bloc polymère (A) qui comprend principalement une unité structurelle dérivée d'un monomère d'oléfine et d'un bloc polymère (B) qui comprend une unité structurelle dérivée d'un monomère vinylique ayant un groupe carboxyle ou un groupe anhydride carboxylique et une unité structurelle dérivée d'un monomère vinylique copolymérisable avec ledit monomère vinylique ; et un milieu de dispersion.
(JA) 分散性、耐薬剤性、接着性に優れるオレフィン系の分散樹脂組成物を提供することを課題とし、オレフィン単量体に由来する構造単位を主として有する重合体ブロック(A)と、カルボキシル基又は無水カルボン酸基を有するビニル系単量体に由来する構造単位、及び前記ビニル系単量体と共重合可能な他のビニル系単量体に由来する構造単位を有する重合体ブロック(B)と、からなり、酸価が5~150mgKOH/gであるブロック共重合体(C)と分散媒を含有する分散樹脂組成物である。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)