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1. (WO2018180561) FLUORINATED ETHER COMPOSITION AND METHOD FOR PRODUCING SAME
Latest bibliographic data on file with the International BureauSubmit observation

Pub. No.: WO/2018/180561 International Application No.: PCT/JP2018/010306
Publication Date: 04.10.2018 International Filing Date: 15.03.2018
IPC:
C08G 65/336 (2006.01) ,C08L 71/00 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
G
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
65
Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
02
from cyclic ethers by opening of the heterocyclic ring
32
Polymers modified by chemical after-treatment
329
with organic compounds
336
containing silicon
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
71
Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
Applicants:
AGC株式会社 AGC INC. [JP/JP]; 東京都千代田区丸の内一丁目5番1号 5-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo 1008405, JP
Inventors:
高尾 清貴 TAKAO Kiyotaka; JP
Agent:
泉名 謙治 SENMYO Kenji; JP
小川 利春 OGAWA Toshiharu; JP
金 鎭文 KIM Jin-Moon; JP
比企野 健 HIKINO Ken; JP
横井 大一郎 YOKOI Daiichiro; JP
Priority Data:
2017-06094927.03.2017JP
Title (EN) FLUORINATED ETHER COMPOSITION AND METHOD FOR PRODUCING SAME
(FR) COMPOSITION D'ÉTHER FLUORÉ ET PROCÉDÉ DE PRODUCTION ASSOCIÉ
(JA) 含フッ素エーテル組成物およびその製造方法
Abstract:
(EN) Provided are: a fluorinated ether composition which can be formed into a surface layer having excellent durability without deteriorating the transparency of a base; and a method for producing a fluorinated ether composition. A fluorinated ether composition containing a compound (A) having a poly(oxyperfluoroalkylene) chain and a group represented by formula (I) and a transition metal compound, wherein the ratio of the mass of the transition metal compound to the mass of the compound (A) is 300 to 4,000 ppm in terms of a transition metal content. (I) -SiRnL3-n; wherein L represents a hydroxyl group or a hydrolysable group, R represents a hydrogen atom or a monovalent hydrocarbon group, and n represents an integer of 0 to 2.
(FR) L'invention concerne : une composition d'éther fluoré qui peut être formée en une couche de surface présentant une excellente durabilité sans détériorer la transparence d'une base ; et un procédé de production d'une composition d'éther fluoré. L'invention concerne une composition d'éther fluoré contenant un composé (A) ayant une chaîne poly(oxyperfluoroalkylène) et un groupe représenté par la formule (I) et un composé de métal de transition, le rapport de la masse du composé de métal de transition à la masse du composé (A) étant de 300 à 4 000 ppm en termes de teneur du métal de transition. (I) -SiRnL3-n ; dans laquelle L représente un groupe hydroxy ou un groupe hydrolysable, R représente un atome d'hydrogène ou un groupe hydrocarboné monovalent et n représente un nombre entier de 0 à 2.
(JA) 基材の透明性を損なうことなく、耐久性に優れる表面層を形成できる含フッ素エーテル組成物および含フッ素エーテル組成物の製造方法の提供。 ポリ(オキシペルフルオロアルキレン)鎖および下式(I)で表される基を有する化合物(A)と、遷移金属化合物とを含む含フッ素エーテル組成物であって、前記化合物(A)に対する前記遷移金属化合物の質量割合が遷移金属換算で300~4,000ppmである、含フッ素エーテル組成物。-SiR3-n・・・(I);ただし、Lは水酸基または加水分解性基であり、Rは水素原子または1価の炭化水素基であり、nは0~2の整数である。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)