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1. (WO2018180049) RADIATION SENSITIVE COMPOSITION AND RESIST PATTERN FORMING METHOD

Pub. No.:    WO/2018/180049    International Application No.:    PCT/JP2018/006324
Publication Date: Fri Oct 05 01:59:59 CEST 2018 International Filing Date: Thu Feb 22 00:59:59 CET 2018
IPC: G03F 7/039
C08F 220/18
C08L 33/10
G03F 7/004
G03F 7/20
Applicants: JSR CORPORATION
JSR株式会社
Inventors: MARUYAMA Ken
丸山 研
Title: RADIATION SENSITIVE COMPOSITION AND RESIST PATTERN FORMING METHOD
Abstract:
The purpose of the present invention is to provide a radiation sensitive composition which has excellent sensitivity and LWR performance. The present invention is a radiation sensitive composition which contains a polymer that has a first structural unit having an acid-cleavable group, a first compound that produces a first acid when irradiated with radiation, and a second compound that produces a second acid when irradiated with radiation, and wherein: the first acid does not substantially dissociate the acid-cleavable group under the conditions of 110°C and one minute; and the second acid dissociates the acid-cleavable group under the conditions of 110°C and one minute. In addition, this radiation sensitive composition satisfies at least one of the condition (1) and the condition (2) described below. (1) The polymer contains a monovalent iodine atom. (2) This radiation sensitive composition additionally contains a third compound which is other than the first compound and the second compound, and which contains a monovalent iodine atom.