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1. (WO2018179417) EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE
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Pub. No.: WO/2018/179417 International Application No.: PCT/JP2017/013816
Publication Date: 04.10.2018 International Filing Date: 31.03.2017
IPC:
G03F 7/20 (2006.01) ,H05G 2/00 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
G
X-RAY TECHNIQUE
2
Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
Applicants: GIGAPHOTON INC.[JP/JP]; 400, Oaza Yokokurashinden, Oyama-shi, Tochigi 3238558, JP
Inventors: UEDA Atsushi; JP
TAKAYAMA Akihiro; JP
Agent: HOSAKA Nobuhisa; JP
Priority Data:
Title (EN) EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE
(FR) DISPOSITIF DE GÉNÉRATION DE LUMIÈRE ULTRAVIOLETTE EXTRÊME
(JA) 極端紫外光生成装置
Abstract:
(EN) This extreme ultraviolet light generation device is provided with: a chamber; an EUV light collecting mirror positioned inside of the chamber; and a hydrogen gas discharge section positioned inside of the chamber, said hydrogen gas discharge section having an opening configured so as to discharge hydrogen gas from the periphery of the EUV light collecting mirror toward the inner side, and a first cooling medium flow channel configured so as to pass a cooling medium.
(FR) La présente invention concerne un dispositif de génération de lumière ultraviolette extrême qui est pourvu de : une chambre ; un miroir de collecte de lumière EUV positionné à l’intérieur de la chambre ; et une section d’évacuation de gaz hydrogène positionnée à l’intérieur de la chambre, ladite section d’évacuation de gaz hydrogène ayant une ouverture configurée de façon à évacuer le gaz d’hydrogène de la périphérie du miroir de collecte de lumière EUV vers le côté interne, et un premier canal d’écoulement de milieu de refroidissement configuré de façon à faire passer un milieu de refroidissement.
(JA) 極端紫外光生成装置は、チャンバと、チャンバの内部に位置するEUV集光ミラーと、チャンバの内部に位置する水素ガス放出部であって、EUV集光ミラーの周辺から内側に向けて水素ガスを放出するように構成された開口部と、冷却媒体を通過させるように構成された第1の冷却媒体流路と、を有する水素ガス放出部と、を備える。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)