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1. (WO2018177898) DEVICE FOR THE ELECTRON-ASSISTED COATING OF SUBSTRATES, AND A CORRESPONDING METHOD
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Pub. No.: WO/2018/177898 International Application No.: PCT/EP2018/057357
Publication Date: 04.10.2018 International Filing Date: 22.03.2018
IPC:
C23C 14/12 (2006.01) ,C23C 14/32 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06
characterised by the coating material
12
Organic material
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
24
Vacuum evaporation
32
by explosion; by evaporation and subsequent ionisation of the vapours
Applicants: TECHNISCHE HOCHSCHULE WILDAU[DE/DE]; Hochschulring 1 15745 Wildau, DE
Inventors: SCHRADER, Sigurd; DE
GRYTSENKO, Kostyantyn; UA
HEINRICH, Friedhelm; DE
KSIANZOU, Viachaslau; DE
Agent: GULDE & PARTNER PATENT- UND RECHTSANWALTSKANZLEI MBB; Wallstr. 58/59 10179 Berlin, DE
Priority Data:
10 2017 106 985.231.03.2017DE
Title (EN) DEVICE FOR THE ELECTRON-ASSISTED COATING OF SUBSTRATES, AND A CORRESPONDING METHOD
(FR) DISPOSITIF DE DÉPÔT DE REVÊTEMENT ASSISTÉ PAR DES ÉLECTRONS SUR DES SUBSTRATS ET PROCÉDÉ CORRESPONDANT
(DE) VORRICHTUNG ZUR ELEKTRONENUNTERSTÜTZTEN BESCHICHTUNG VON SUBSTRATEN SOWIE EIN ENTSPRECHENDES VERFAHREN
Abstract:
(EN) The invention relates to a device (100) for the electron-assisted coating of substrates (60), comprising a vacuum receptacle (90) designed for providing a vacuum (80). The device (100) also comprises at least one carrier element (70) designed for receiving the substrate (60) to be coated, and a material source (50), in particular an evaporator unit for providing organic molecules. According to the invention, the device (100) further comprises an electron source (40) for the release of electrons (30) within the vacuum receptacle (90). The invention also relates to a corresponding method for the electron-assisted coating of a substrate (60).
(FR) L’invention concerne un dispositif (100) de dépôt de revêtement assisté par des électrons sur des substrats (60), lequel dispositif comprend un récipient à vide (90) conçu pour délivrer un vide (80). De plus, le dispositif (100) comprend au moins un élément support (70) qui est conçu pour recevoir le substrat (60) à pourvoir d’un revêtement ainsi qu’une source de matière (50), notamment une unité formant évaporateur destinée à céder des molécules organiques. Selon l’invention, le dispositif (100) comprend également une source d’électrons (40) destinée à la libération d’électrons (30) à l’intérieur du récipient à vide (90). L’invention concerne un procédé correspondant destiné au dépôt d’un revêtement assisté par des électrons sur un substrat (60).
(DE) Es wird eine Vorrichtung (100) zur elektronenunterstützten Beschichtung von Substraten (60) zur Verfügung gestellt, welche einen Vakuum-Rezipienten (90) umfasst, der zur Bereitstellung eines Vakuums (80) ausgebildet ist. Ferner umfasst die Vorrichtung (100) mindestens ein Trägerelement (70), welches zur Aufnahme des zu beschichtenden Substrates (60) ausgebildet ist sowie eine Materialquelle (50), insbesondere eine Verdampfer-Einheit zur Bereitstellung organischer Moleküle. Erfindungsgemäß umfasst die Vorrichtung (100) ferner eine Elektronenquelle (40) für die Freigabe von Elektronen (30) innerhalb des Vakuum-Rezipienten (90). Ferner wird ein entsprechendes Verfahren zur elektronenunterstützten Beschichtung eines Substrates 60 vorgeschlagen.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: German (DE)
Filing Language: German (DE)