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1. (WO2018177724) OPTICAL SYSTEM, AND METHOD
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Pub. No.: WO/2018/177724 International Application No.: PCT/EP2018/055923
Publication Date: 04.10.2018 International Filing Date: 09.03.2018
IPC:
G03F 7/20 (2006.01) ,G02B 26/08 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
26
Optical devices or arrangements using movable or deformable optical elements for controlling the intensity, colour, phase, polarisation or direction of light, e.g. switching, gating, modulating
08
for controlling the direction of light
Applicants: CARL ZEISS SMT GMBH[DE/DE]; Rudolf-Eber-Strasse 2 73447 Oberkochen, DE
Inventors: JÜRGENS, Dirk; DE
HILD, Kerstin; DE
GEH, Bernd; US
Agent: HORN KLEIMANN WAITZHOFER PATENTANWÄLTE PARTG MBB; Ganghoferstr. 29a 80339 München, DE
Priority Data:
10 2017 208 364.618.05.2017DE
62/478,12129.03.2017US
Title (EN) OPTICAL SYSTEM, AND METHOD
(FR) SYSTÈME OPTIQUE ET PROCÉDÉ
(DE) OPTISCHES SYSTEM SOWIE VERFAHREN
Abstract:
(EN) The invention relates to an optical system (200) for a lithography machine (100A, 100B), comprising a main mirror element (206), a manipulator device (400) for positioning and/or orienting said main mirror element (206), an optically active surface (306, 306') for reflecting radiation (108A, 108B), and an actuator matrix (308) which is positioned between the main mirror element (206) and the optically active surface (306, 306') and is configured to deform the optically active surface (306, 306') in order to influence the reflective properties thereof, a gap (316) being provided between the actuator matrix (308) and a front side (214) of the main mirror element (206) in order for the actuator matrix (308) to be spaced apart from the main mirror element (206).
(FR) L'invention concerne un système optique (200) destiné à une installation de lithographie (100A, 100B), présentant un corps de base réfléchissant (206), un dispositif de manipulation (400) permettant de positionner et/ou d'orienter le corps de base réfléchissant (206), une surface optiquement active (306, 306') permettant de réfléchir le rayonnement (108A, 108B), et une matrice d'actionnement (308) qui est agencée entre le corps de base réfléchissant (206) et la surface optiquement active (306, 306') et qui est conçu pour déformer la surface optiquement active (306, 306') pour agir sur ses caractéristiques de réflexion, une fente (316) étant ménagée entre la matrice d'actionnement (308) et une face avant (214) du corps de base réfléchissant (206) pour écarter la matrice d'actionnement (308) du corps de base réfléchissant (206).
(DE) Optisches System (200) für eine Lithographieanlage (100A, 100B), aufweisend einen Spiegelgrundkörper (206), eine Manipulatoreinrichtung (400) zum Positionieren und/oder Orientieren des Spiegelgrundkörpers (206), eine optisch wirksame Fläche (306, 306') zum Reflektieren von Strahlung (108A, 108B), und eine Aktuatorenmatrix (308), die zwischen dem Spiegelgrundkörper (206) und der optisch wirksamen Fläche (306, 306') angeordnet ist und die dazu eingerichtet ist, die optisch wirksamen Fläche (306, 306') zu verformen, um deren Reflexionseigenschaften zu beeinflussen, wobei zwischen der Aktuatorenmatrix (308) und einer Vorderseite (214) des Spiegelgrundkörpers (206) ein Spalt (316) zum Beabstanden der Aktuatorenmatrix (308) von dem Spiegelgrundkörper (206) vorgesehen ist.
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: German (DE)
Filing Language: German (DE)