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1. (WO2018177668) APPARATUS, SUBSTRATE HANDLER, PATTERNING DEVICE HANDLER, DAMPING SYSTEM AND METHOD OF MANUFACTURING A DAMPING SYSTEM
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Pub. No.: WO/2018/177668 International Application No.: PCT/EP2018/054871
Publication Date: 04.10.2018 International Filing Date: 28.02.2018
IPC:
G03F 7/20 (2006.01) ,F16F 7/104 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
F MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
16
ENGINEERING ELEMENTS OR UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
F
SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
7
Vibration-dampers; Shock-absorbers
10
using inertia effect
104
the inertia member being resiliently mounted
Applicants:
ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
Inventors:
VERHEES, Mathijs, Leonardus, Johan; NL
VENNAT, Eric, Pierre-Yves; NL
VAN DORDRECHT, Martijn; NL
DEBIESME, Francois-Xavier; NL
Agent:
RAS, Michael; NL
Priority Data:
17163838.030.03.2017EP
Title (EN) APPARATUS, SUBSTRATE HANDLER, PATTERNING DEVICE HANDLER, DAMPING SYSTEM AND METHOD OF MANUFACTURING A DAMPING SYSTEM
(FR) APPAREIL, MANIPULATEUR DE SUBSTRAT, MANIPULATEUR DE DISPOSITIF DE MODELAGE, SYSTÈME D’AMORTISSEMENT ET PROCÉDÉ DE FABRICATION D’UN SYSTÈME D’AMORTISSEMENT
Abstract:
(EN) The invention relates to an apparatus comprising a structure (S) and a damping system (DS). The structure has a first eigenmode and a second eigenmode. The damping system comprises a first mass (FM), a first damping device (DD1), a first spring (FS), a second mass (SM), a second damping device (DD2) and a second spring (SS). The first mass is connected to the structure using the first damping device and the first spring. The second mass is connected to the first mass using the second damping device and the second spring. The damping system is arranged to dampen the first eigenmode by movement of the first mass and the second mass, and is arranged to dampen the second eigenmode by movement of the second mass.
(FR) La présente invention concerne un appareil comprenant une structure (S) et un système d’amortissement (DS). La structure a un premier mode propre et un deuxième mode propre. Le système d’amortissement comprend une première masse (FM), un premier dispositif d’amortissement (DD1), un premier ressort (FS), une deuxième masse (SM), un deuxième dispositif d’amortissement (DD2) et un deuxième ressort (SS). La première masse est reliée à la structure au moyen du premier dispositif d’amortissement et du premier ressort. La deuxième masse est reliée à la première masse au moyen du deuxième dispositif d’amortissement et du deuxième ressort. Le système d’amortissement est agencé pour amortir le premier mode propre par déplacement de la première masse et de la deuxième masse, et est agencé pour amortir le deuxième mode propre par déplacement de la deuxième masse
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)