Search International and National Patent Collections

1. (WO2018177601) OXIDATION FURNACE

Pub. No.:    WO/2018/177601    International Application No.:    PCT/EP2018/000146
Publication Date: Fri Oct 05 01:59:59 CEST 2018 International Filing Date: Fri Mar 30 01:59:59 CEST 2018
IPC: F27B 17/00
F27D 99/00
H01L 21/02
H01L 21/67
Applicants: SOITEC
Inventors: HENAULT, Arnaud
COCCHI, Anne-Sophie
PAILLAS, Julien
BOTTIERO, Joel
LANDRU, Didier
KOKONGCHUCK, Oleg
Title: OXIDATION FURNACE
Abstract:
The invention relates to a semiconductor wafer oxidation furnace comprising a torch (12) connected to a furnace tube (11) by a fluidic connection (14) and a means for adjusting a gas flow downstream of the torch (12) in the direction of the furnace tube (11).