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1. (WO2018176567) ARRAY SUBSTRATE MANUFACTURING METHOD

Pub. No.:    WO/2018/176567    International Application No.:    PCT/CN2017/082814
Publication Date: Fri Oct 05 01:59:59 CEST 2018 International Filing Date: Thu May 04 01:59:59 CEST 2017
IPC: H01L 21/77
H01L 27/12
Applicants: SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
深圳市华星光电半导体显示技术有限公司
Inventors: ZHOU, Zhichao
周志超
Title: ARRAY SUBSTRATE MANUFACTURING METHOD
Abstract:
An array substrate manufacturing method, comprising: forming a buffer layer (12) on a substrate (11); forming a source (106) and a data line (105) in the buffer layer (12), and forming, on the buffer layer (12), a first gate (103), a second gate (104), a first scan line (101), and a second scan line (102); forming a semiconductor layer (17); performing conductor conversion on the semiconductor layer (17) located on the first scan line (101) and the second scan line (102) to form a conductor layer (21); and forming a first pixel electrode on the semiconductor layer (17), and forming a second pixel electrode on the conductor layer (21).