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1. (WO2018176566) METHOD FOR MANUFACTURING ARRAY SUBSTRATE, AND ARRAY SUBSTRATE

Pub. No.:    WO/2018/176566    International Application No.:    PCT/CN2017/082813
Publication Date: Fri Oct 05 01:59:59 CEST 2018 International Filing Date: Thu May 04 01:59:59 CEST 2017
IPC: H01L 27/12
Applicants: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD
武汉华星光电技术有限公司
Inventors: HONG, Guanghui
洪光辉
GONG, Qiang
龚强
Title: METHOD FOR MANUFACTURING ARRAY SUBSTRATE, AND ARRAY SUBSTRATE
Abstract:
A method for manufacturing an array substrate, and an array substrate. The array substrate comprises: a first metal layer (306) used for forming a gate (3061), a scan line (3062), a first data line (3063), and a second data line (3064) of a thin film transistor, wherein the first data line (3063) and the second data line (3064) are located at two ends of the scan line (3062) and are not connected with each other; and a second metal layer (308) used for forming a source (3081), a drain (3082), a connection line (3083), and a touch signal line (3084) of the thin film transistor, wherein the connection line (3083) is used for connecting the first data line (3063) and the second data line (3064).