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1. (WO2018166896) NANOIMPRINT LITHOGRAPHY PROCESS AND PATTERNED SUBSTRATE OBTAINABLE THEREFROM

Pub. No.:    WO/2018/166896    International Application No.:    PCT/EP2018/055825
Publication Date: Fri Sep 21 01:59:59 CEST 2018 International Filing Date: Fri Mar 09 00:59:59 CET 2018
IPC: G03F 7/00
Applicants: UNIVERSITE D'AIX-MARSEILLE
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE
UNIVERSITE PIERRE ET MARIE CURIE (PARIS 6)
UNIVERSITE PARIS-SUD
Inventors: GROSSO, David
FAUSTINI, Marco
DALSTEIN, Olivier
CATTONI, Andréa
BOTTEIN, Thomas
Title: NANOIMPRINT LITHOGRAPHY PROCESS AND PATTERNED SUBSTRATE OBTAINABLE THEREFROM
Abstract:
The present invention pertains to the field of nanoimprint lithography (NIL) processes and more specifically to a soft NIL process used for providing a sol-gel patterned layer on a substrate. Specifically, this process comprises a step of adjusting the solvent uptake of the sol- gel film to 10 to 50% vol., preferably between 15 and 40% vol., by varying the relative pressure of the solvent while a soft mould is applied onto the substrate coated with the sol-gel film.