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1. (WO2018166738) A SENSOR MARK AND A METHOD OF MANUFACTURING A SENSOR MARK

Pub. No.:    WO/2018/166738    International Application No.:    PCT/EP2018/053761
Publication Date: Fri Sep 21 01:59:59 CEST 2018 International Filing Date: Fri Feb 16 00:59:59 CET 2018
IPC: G03F 7/20
G03F 9/00
G01J 1/42
Applicants: ASML NETHERLANDS B.V.
Inventors: KLUGKIST, Joost, André
BANINE, Vadim, Yevgenyevich
BECKERS, Johan, Franciscus, Maria
JAMBUNATHAN, Madhusudhanan
NASALEVICH, Maxim, Aleksandrovich
NIKIPELOV, Andrey
STAS, Roland, Johannes, Wilhelmus
VLES, David, Ferdinand
WELTERS, Wilhelmus, Jacobus, Johannes
WRICKE, Sandro
Title: A SENSOR MARK AND A METHOD OF MANUFACTURING A SENSOR MARK
Abstract:
A sensor mark (17) comprising: a substrate (200) having: a first deep ultra violet (DUV) absorbing layer (310, 320, 330) comprising a first material which substantially absorbs DUV radiation; a first protecting layer (600) comprising a second material; wherein: the first DUV absorbing layer has a first through hole (500) in it; the first protecting layer is positioned, in plan, in the first through hole (500) and the first protecting layer in the first through hole has a patterned region comprising a plurality of through holes (700); and the second material is more noble than the first material.