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|1. (WO2018166738) A SENSOR MARK AND A METHOD OF MANUFACTURING A SENSOR MARK|
|Applicants:||ASML NETHERLANDS B.V.
|Inventors:||KLUGKIST, Joost, André
BANINE, Vadim, Yevgenyevich
BECKERS, Johan, Franciscus, Maria
NASALEVICH, Maxim, Aleksandrovich
STAS, Roland, Johannes, Wilhelmus
VLES, David, Ferdinand
WELTERS, Wilhelmus, Jacobus, Johannes
|Title:||A SENSOR MARK AND A METHOD OF MANUFACTURING A SENSOR MARK|
A sensor mark (17) comprising: a substrate (200) having: a first deep ultra violet (DUV) absorbing layer (310, 320, 330) comprising a first material which substantially absorbs DUV radiation; a first protecting layer (600) comprising a second material; wherein: the first DUV absorbing layer has a first through hole (500) in it; the first protecting layer is positioned, in plan, in the first through hole (500) and the first protecting layer in the first through hole has a patterned region comprising a plurality of through holes (700); and the second material is more noble than the first material.