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1. (WO2018166621) DEPOSITION APPARATUS, VACUUM SYSTEM, AND METHOD OF OPERATING A DEPOSITION APPARATUS
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Pub. No.: WO/2018/166621 International Application No.: PCT/EP2017/056382
Publication Date: 20.09.2018 International Filing Date: 17.03.2017
IPC:
C23C 14/24 (2006.01) ,C23C 14/56 (2006.01) ,H01L 51/00 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
24
Vacuum evaporation
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
56
Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
Applicants:
ZANG, Sebastian Gunther [DE/DE]; DE (US)
SAUER, Andreas [DE/DE]; DE (US)
HEIMEL, Oliver [DE/DE]; DE (US)
APPLIED MATERIALS, INC. [US/US]; 3050 Bowers Avenue Santa Clara, CA 95054, US
Inventors:
ZANG, Sebastian Gunther; DE
SAUER, Andreas; DE
HEIMEL, Oliver; DE
Agent:
ZIMMERMANN & PARTNER PATENTANWÄLTE MBB; Josephspitalstr. 15 80331 München, DE
Priority Data:
Title (EN) DEPOSITION APPARATUS, VACUUM SYSTEM, AND METHOD OF OPERATING A DEPOSITION APPARATUS
(FR) APPAREIL DE DÉPÔT, SYSTÈME DE VIDE ET PROCÉDÉ DE FONCTIONNEMENT D'UN APPAREIL DE DÉPÔT
Abstract:
(EN) The present disclosure provides a deposition apparatus (100) for a vacuum deposition process. The deposition apparatus includes a vacuum chamber (130), a movable deposition source (110) arranged in the vacuum chamber, and a supply arrangement (120) providing a supply passage for media supply lines for the movable deposition source, wherein the supply arrangement comprises an axially deflectable element (122).
(FR) La présente invention concerne un appareil de dépôt (100) destiné à un procédé de dépôt sous vide. L'appareil de dépôt comprend une chambre à vide (130), une source de dépôt mobile (110) disposée dans la chambre à vide, et un agencement d'alimentation (120) fournissant un passage d'alimentation pour des lignes d'alimentation en milieu pour la source de dépôt mobile, l'agencement d'alimentation comprenant un élément (122) pouvant être dévié axialement.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)