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1. (WO2018166022) METHOD FOR MANUFACTURING TFT SUBSTRATE, AND TFT SUBSTRATE

Pub. No.:    WO/2018/166022    International Application No.:    PCT/CN2017/080080
Publication Date: Fri Sep 21 01:59:59 CEST 2018 International Filing Date: Wed Apr 12 01:59:59 CEST 2017
IPC: H01L 27/12
H01L 21/77
Applicants: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
武汉华星光电技术有限公司
Inventors: KIM, Wonjoong
金元仲
MENG, Lin
孟林
Title: METHOD FOR MANUFACTURING TFT SUBSTRATE, AND TFT SUBSTRATE
Abstract:
Disclosed are a method for manufacturing a TFT substrate and a TFT substrate. In the method for manufacturing a TFT substrate, the pattern of a gate metal layer (14) is designed so that the gate metal layer (14) is provided with a reflecting block (142) in an area where bridging holes (181, 182) are correspondingly formed; thus, during the process of forming the bridging holes (181, 182), light rays are reflected by means of the reflecting block (142), so as to strengthen the exposure intensity at the position where the bridging holes (181, 182) are formed; and with the limitations of the exposure limit dimension of an existing exposure machine, sufficient exposure may still be ensured when the bridging holes (181, 182) are formed in a high-PPI display panel device, so that the production of a high-PPI display panel product may be realized. By means of the TFT substrate, sufficient exposure may be ensured when the bridging holes are formed in the high-PPI display panel device, so that the production of a high-PPI display panel product may be realized.