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1. (WO2018164233) PHOTOSENSITIVE ELEMENT, SEMICONDUCTOR DEVICE, AND METHOD FOR FORMING RESIST PATTERN

Pub. No.:    WO/2018/164233    International Application No.:    PCT/JP2018/009068
Publication Date: Fri Sep 14 01:59:59 CEST 2018 International Filing Date: Fri Mar 09 00:59:59 CET 2018
IPC: G03F 7/038
B32B 27/04
G03F 7/004
G03F 7/075
G03F 7/20
H05K 1/03
H05K 3/28
H05K 3/46
Applicants: HITACHI CHEMICAL COMPANY, LTD.
日立化成株式会社
Inventors: KATO Tetsuya
加藤 哲也
IWASHITA Kenichi
岩下 健一
SUZUKI Yoshikazu
鈴木 慶一
Title: PHOTOSENSITIVE ELEMENT, SEMICONDUCTOR DEVICE, AND METHOD FOR FORMING RESIST PATTERN
Abstract:
Disclosed is a photosensitive element having a photosensitive layer and a protective layer, wherein the photosensitive layer contains: component (A), a resin having a phenolic hydroxyl group; component (B), a photosensitive acid generator; component (C), a compound having at least one selected from the group consisting of an aromatic ring, a heterocyclic ring, and an alicyclic ring, and having at least one among a methylol group and an alkoxyalkyl group; and component (D), an aliphatic compound having two or more of at least one functional group selected from the group consisting of an acryloyloxy group, a methacryloyloxy group, a glycidyloxy group, an oxetanylalkyl ether group, a vinyl ether group, and a hydroxyl group, and the contents of component (C) and component (D) in the photosensitive layer are within specific ranges.