Search International and National Patent Collections
|1. (WO2018164233) PHOTOSENSITIVE ELEMENT, SEMICONDUCTOR DEVICE, AND METHOD FOR FORMING RESIST PATTERN|
|Applicants:||HITACHI CHEMICAL COMPANY, LTD.
|Title:||PHOTOSENSITIVE ELEMENT, SEMICONDUCTOR DEVICE, AND METHOD FOR FORMING RESIST PATTERN|
Disclosed is a photosensitive element having a photosensitive layer and a protective layer, wherein the photosensitive layer contains: component (A), a resin having a phenolic hydroxyl group; component (B), a photosensitive acid generator; component (C), a compound having at least one selected from the group consisting of an aromatic ring, a heterocyclic ring, and an alicyclic ring, and having at least one among a methylol group and an alkoxyalkyl group; and component (D), an aliphatic compound having two or more of at least one functional group selected from the group consisting of an acryloyloxy group, a methacryloyloxy group, a glycidyloxy group, an oxetanylalkyl ether group, a vinyl ether group, and a hydroxyl group, and the contents of component (C) and component (D) in the photosensitive layer are within specific ranges.