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1. (WO2018163883) POLYETHYLENE FILM FOR VAPOR DEPOSITION SUBSTRATES AND VAPOR DEPOSITION FILM USING SAME
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Pub. No.: WO/2018/163883 International Application No.: PCT/JP2018/006946
Publication Date: 13.09.2018 International Filing Date: 26.02.2018
IPC:
B32B 27/18 (2006.01) ,B32B 27/32 (2006.01) ,C23C 14/20 (2006.01) ,C23C 14/14 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
27
Layered products essentially comprising synthetic resin
18
characterised by the use of special additives
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
27
Layered products essentially comprising synthetic resin
32
comprising polyolefins
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06
characterised by the coating material
14
Metallic material, boron or silicon
20
on organic substrates
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06
characterised by the coating material
14
Metallic material, boron or silicon
Applicants:
東洋紡株式会社 TOYOBO CO., LTD. [JP/JP]; 大阪府大阪市北区堂島浜二丁目2番8号 2-8, Dojima Hama 2-chome, Kita-ku, Osaka-shi, Osaka 5308230, JP
Inventors:
大木 祐和 OGI, Hirokazu; JP
納 聡 OSAME, Satoshi; JP
田中 裕基 TANAKA, Hiroki; JP
Agent:
植木 久一 UEKI, Kyuichi; JP
植木 久彦 UEKI, Hisahiko; JP
菅河 忠志 SUGAWA, Tadashi; JP
伊藤 浩彰 ITO, Hiroaki; JP
Priority Data:
2017-04309607.03.2017JP
Title (EN) POLYETHYLENE FILM FOR VAPOR DEPOSITION SUBSTRATES AND VAPOR DEPOSITION FILM USING SAME
(FR) FILM DE POLYÉTHYLÈNE POUR SUBSTRATS DE DÉPÔT EN PHASE VAPEUR ET FILM DE DÉPÔT EN PHASE VAPEUR L'UTILISANT
(JA) 蒸着基材用ポリエチレン系フィルム及びそれを用いた蒸着フィルム
Abstract:
(EN) The present invention addresses the problem of providing a polyethylene film for vapor deposition substrates, which enables the achievement of a vapor deposition film having excellent barrier properties even if the vapor deposition film is obtained by means of vapor deposition using a large-sized vapor deposition machine. A polyethylene film for vapor deposition substrates, which is used as a substrate for a vapor deposition layer, and which is characterized by comprising at least a laminate layer that serves as the vapor deposition layer-side surface and a seal layer that serves as the other surface. This polyethylene film for vapor deposition substrates is also characterized in that: the seal layer contains inorganic particles; the Mohs hardness of the inorganic particles contained in the seal layer is 3 or less; and the seal layer satisfies at least one of the requirements (i) and (ii) described below. (i) The inorganic particles contained in the seal layer have an average particle diameter of from 5 μm to 15 μm (inclusive). (ii) The three-dimensional surface roughness SRa of the sealing layer surface is 0.2 μm or less, and the maximum peak height SRmax of the sealing layer surface is 6 μm or less.
(FR) La présente invention traite le problème de la réalisation d'un film de polyéthylène pour substrats de dépôt en phase vapeur, qui permet d'obtenir un film de dépôt en phase vapeur présentant d'excellentes propriétés de barrière même si le film de dépôt en phase vapeur est obtenu par dépôt de vapeur à l'aide d'une machine de dépôt en phase vapeur de grande taille. Un film de polyéthylène pour substrats de dépôt en phase vapeur selon l'invention est utilisé en tant que substrat pour une couche de dépôt en phase vapeur, et est caractérisé en ce qu'il comporte au moins une couche stratifiée servant de surface côté couche de dépôt en phase vapeur et une couche d'étanchéité servant d'autre surface. Ce film de polyéthylène pour substrats de dépôt en phase vapeur est également caractérisé en ce que: la couche d'étanchéité contient des particules inorganiques; la dureté Mohs des particules inorganiques contenues dans la couche d'étanchéité est d'au plus 3; et la couche d'étanchéité satisfait au moins une des exigences (i) et (ii) décrites ci-dessous. (i) Les particules inorganiques contenues dans la couche d'étanchéité présentent un diamètre moyen de particules allant de 5 µm à 15 µm (inclus). (ii) La rugosité de surface tridimensionnelle SRa de la surface de la couche d'étanchéité est d'au plus 0,2 µm, et la hauteur maximale de pics SRmax de la surface de la couche d'étanchéité est d'au plus 6 µm.
(JA) 大型蒸着機を用いて蒸着を施した蒸着フィルムであっても優れたバリア性を有する蒸着基材用ポリエチレン系フィルムを提供することを課題として掲げる。 蒸着層の基材として用いるためのポリエチレン系フィルムであって、上記ポリエチレン系フィルムは、蒸着層側の表面となるラミネート層と、他方の表面となるシール層とを少なくとも有し、上記シール層は、無機粒子を含んでおり、上記シール層に含有されている上記無機粒子のモース硬度が3以下であり、かつ、以下の(i)及び(ii)の少なくとも一方を満たすことを特徴とする蒸着基材用ポリエチレン系フィルムであることを特徴とする。 (i)上記シール層に含有されている上記無機粒子の平均粒径が5μm以上15μm以下である (ii)上記シール層表面の三次元表面粗さSRaが0.2μm以下であり、上記シール層表面の最大山高さSRmaxが6μm以下である
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)