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1. (WO2018163861) Cu-Ni ALLOY SPUTTERING TARGET AND PRODUCTION METHOD THEREFOR
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2018/163861 International Application No.: PCT/JP2018/006685
Publication Date: 13.09.2018 International Filing Date: 23.02.2018
IPC:
C23C 14/34 (2006.01) ,C22C 9/06 (2006.01) ,C22C 19/03 (2006.01) ,C22F 1/00 (2006.01) ,C22F 1/10 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
34
Sputtering
C CHEMISTRY; METALLURGY
22
METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
C
ALLOYS
9
Alloys based on copper
06
with nickel or cobalt as the next major constituent
C CHEMISTRY; METALLURGY
22
METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
C
ALLOYS
19
Alloys based on nickel or cobalt
03
based on nickel
C CHEMISTRY; METALLURGY
22
METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
F
CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS OR NON-FERROUS ALLOYS
1
Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
C CHEMISTRY; METALLURGY
22
METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
F
CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS OR NON-FERROUS ALLOYS
1
Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
10
of nickel or cobalt or alloys based thereon
Applicants:
三菱マテリアル株式会社 MITSUBISHI MATERIALS CORPORATION [JP/JP]; 東京都千代田区大手町一丁目3番2号 3-2, Otemachi 1-chome, Chiyoda-ku, Tokyo 1008117, JP
Inventors:
小見山 昌三 KOMIYAMA Shozo; JP
Agent:
松沼 泰史 MATSUNUMA Yasushi; JP
寺本 光生 TERAMOTO Mitsuo; JP
細川 文広 HOSOKAWA Fumihiro; JP
大浪 一徳 ONAMI Kazunori; JP
Priority Data:
2017-04216206.03.2017JP
2017-24110315.12.2017JP
Title (EN) Cu-Ni ALLOY SPUTTERING TARGET AND PRODUCTION METHOD THEREFOR
(FR) CIBLE DE PULVÉRISATION EN ALLIAGE Cu-Ni ET SON PROCÉDÉ DE PRODUCTION
(JA) Cu-Ni合金スパッタリングターゲット及びその製造方法
Abstract:
(EN) This Cu-Ni alloy sputtering target has a composition such that: Ni is contained in the range of 16 mass% to 55 mass%; the hydrogen content is less than 5 mass ppm, the oxygen content is 500 mass ppm or less, and the carbon content is 500 mass ppm or less; and the balance is Cu and unavoidable impurities. The number of voids with a maximum diameter of at least 2 µm is not more than 1 per 1 mm2 region in the sputtering surface.
(FR) Cette cible de pulvérisation en alliage Cu-Ni a une composition telle que : Ni est contenu dans la plage de 16 % en masse à 55 % en masse; la teneur en hydrogène est inférieure à 5 ppm en masse, la teneur en oxygène est de 500 ppm en masse ou moins, et la teneur en carbone est de 500 ppm en masse ou moins; et le reste est du Cu et des impuretés inévitables. Le nombre de vides ayant un diamètre maximal supérieur ou égal à 2 µm est inférieur ou égal à 1 par zone de 1 mm2 dans la surface de pulvérisation.
(JA) このCu-Ni合金スパッタリングターゲットは、Niを16質量%以上55質量%以下の範囲で含有し、水素の含有量が5質量ppm未満、酸素の含有量が500質量ppm以下、炭素の含有量が500質量ppm以下であり、残部がCuおよび不可避不純物からなる組成を有し、最大径が2μm以上のボイドの数が、スパッタ面内の1mmの領域あたり1個以下である。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)