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1. (WO2018163780) SURFACE TREATMENT COMPOSITION, PRODUCTION METHOD THEREFOR, SURFACE TREATMENT METHOD USING SURFACE TREATMENT COMPOSITION, AND PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATE
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Pub. No.: WO/2018/163780 International Application No.: PCT/JP2018/005777
Publication Date: 13.09.2018 International Filing Date: 19.02.2018
IPC:
H01L 21/304 (2006.01) ,C09K 3/14 (2006.01) ,C11D 7/22 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
04
the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
18
the devices having semiconductor bodies comprising elements of the fourth group of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
30
Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20-H01L21/26142
302
to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
304
Mechanical treatment, e.g. grinding, polishing, cutting
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
K
MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
3
Materials not provided for elsewhere
14
Anti-slip materials; Abrasives
C CHEMISTRY; METALLURGY
11
ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
D
DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
7
Compositions of detergents based essentially on non-surface-active compounds
22
Organic compounds
Applicants:
株式会社フジミインコーポレーテッド FUJIMI INCORPORATED [JP/JP]; 愛知県清須市西枇杷島町地領二丁目1番地1 1-1, Chiryo 2-chome, Nishibiwajima-cho, Kiyosu-shi, Aichi 4528502, JP
Inventors:
石田 康登 ISHIDA, Yasuto; JP
吉野 努 YOSHINO, Tsutomu; JP
大西 正悟 ONISHI, Shogo; JP
吉▲崎▼ 幸信 YOSHIZAKI, Yukinobu; JP
Agent:
八田国際特許業務法人 HATTA & ASSOCIATES; 東京都千代田区二番町11番地9 ダイアパレス二番町 Dia Palace Nibancho, 11-9, Nibancho, Chiyoda-ku, Tokyo 1020084, JP
Priority Data:
2017-04211006.03.2017JP
2017-18515226.09.2017JP
Title (EN) SURFACE TREATMENT COMPOSITION, PRODUCTION METHOD THEREFOR, SURFACE TREATMENT METHOD USING SURFACE TREATMENT COMPOSITION, AND PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATE
(FR) COMPOSITION DE TRAITEMENT DE SURFACE AINSI QUE PROCÉDÉ DE FABRICATION DE CELLE-CI, PROCÉDÉ DE TRAITEMENT DE SURFACE METTANT EN ŒUVRE CETTE COMPOSITION DE TRAITEMENT DE SURFACE, ET PROCÉDÉ DE FABRICATION DE SUBSTRAT SEMI-CONDUCTEUR
(JA) 表面処理組成物、およびその製造方法、ならびに表面処理組成物を用いた表面処理方法および半導体基板の製造方法
Abstract:
(EN) [Problem] To provide a means for sufficiently removing residue remaining on the surface of a polished object to be polished. [Solution] A surface treatment composition containing a polymer compound and water and having a pH of less than 7, said polymer compound: having at least one type of ionic functional group selected from the group consisting of a sulfonic acid (salt) group, a phosphoric acid (salt) group, a phosphonic acid (salt) group, a carboxylic acid (salt) group, and an amino group; having a pKa of no more than 3; and having a weight-average molecular weight of 3,500–100,000.
(FR) L’invention a pour objet de fournir un moyen destiné à retirer de manière suffisante des résidus restant à la surface d’un objet à polir à l’aide d’un agent de polissage. Plus précisément, l’invention concerne une composition de traitement de surface qui présente une valeur pH inférieure à 7, et qui comprend : un composé macromoléculaire possédant au moins une sorte de groupe fonctionnel ionique choisie dans un groupe constitué d’un groupe acide sulfonique (sulfonate), d’un groupe acide phosphorique (phosphate), d’un groupe acide phosphonique (phosphonate), d’un groupe acide carboxylique (carboxylate), et d’un groupe amino ; et une eau. Ledit composé macromoléculaire présente une valeur pKa inférieure ou égale à 3, et une masse moléculaire moyenne en poids supérieure ou égale à 3500 et inférieure ou égale à 100000.
(JA) 【課題】研磨済研磨対象物の表面に残留する残渣を十分に除去する手段を提供することを目的とする。 【解決手段】スルホン酸(塩)基、リン酸(塩)基、ホスホン酸(塩)基、カルボン酸(塩)基、およびアミノ基からなる群より選択される少なくとも1種のイオン性官能基を有する高分子化合物と、水と、を含有し、pH値が7未満であり、前記高分子化合物は、pKaが3以下であり、かつ重量平均分子量が3,500以上100,000以下である、表面処理組成物。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)