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1. (WO2018160688) PATTERNED SUBSTRATE IMAGING USING MULTIPLE ELECTRON BEAMS

Pub. No.:    WO/2018/160688    International Application No.:    PCT/US2018/020217
Publication Date: Sat Sep 08 01:59:59 CEST 2018 International Filing Date: Thu Mar 01 00:59:59 CET 2018
IPC: H01J 37/256
Applicants: DONGFANG JINGYUAN ELECTRON LIMITED
ZHAO, Yan
Inventors: ZHAO, Yan
SUN, Weiqiang
FENG, Tao
Title: PATTERNED SUBSTRATE IMAGING USING MULTIPLE ELECTRON BEAMS
Abstract:
A method for imaging a surface of a substrate using a multibeam imaging system includes: modifying an electron beam using a multipole field device; generating beamlets from the electron beam using a beam splitting device having multiple apertures; in response to projecting foci of the beamlets onto the surface, driving the beamlets using a deflector set to scan a region of the surface for receiving signals based on electrons scattered from the region; and determining an image of the region for inspection based on the signals. The multibeam imaging system includes: an electron source; a first multipole field device for beam shaping and beam aberration correction; a beam splitting device; a projection lens set; a deflector set; an objective lens set; a detector array; a second multipole field device; a processor; and a memory storing instructions to determine an image of the region for inspection based on the signals.