Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2018159687) WAFER HEATING DEVICE
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2018/159687 International Application No.: PCT/JP2018/007532
Publication Date: 07.09.2018 International Filing Date: 28.02.2018
IPC:
H05B 3/02 (2006.01) ,H01L 21/02 (2006.01) ,H05B 3/74 (2006.01)
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
B
ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
3
Ohmic-resistance heating
02
Details
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
B
ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
3
Ohmic-resistance heating
68
Heating arrangements specially adapted for cooking plates or analogous hot-plates
74
Non-metallic plates
Applicants:
日本碍子株式会社 NGK INSULATORS, LTD. [JP/JP]; 愛知県名古屋市瑞穂区須田町2番56号 2-56, Suda-cho, Mizuho-ku, Nagoya-city, Aichi 4678530, JP
Inventors:
竹林 央史 TAKEBAYASHI, Hiroshi; JP
鳥居 謙悟 TORII, Kengo; JP
平田 夏樹 HIRATA, Natsuki; JP
Agent:
特許業務法人アイテック国際特許事務所 ITEC INTERNATIONAL PATENT FIRM; 愛知県名古屋市中区錦二丁目16番26号SC伏見ビル SC Fushimi Bldg., 16-26, Nishiki 2-chome, Naka-ku, Nagoya-shi, Aichi 4600003, JP
Priority Data:
62/465,98202.03.2017US
Title (EN) WAFER HEATING DEVICE
(FR) DISPOSITIF DE CHAUFFAGE DE TRANCHE
(JA) ウエハ加熱装置
Abstract:
(EN) In the present invention, a ceramic heater (10) includes: a circular plate-shaped ceramic base (12), one surface thereof serving as a wafer mounting surface; and a central zone resistance heating element (20) and an outer circumferential zone resistance heating element (50) which are embedded in the circular plate-shaped ceramic base. The central zone resistance heating element (20) has wiring provided in a unicursal manner, from one end to another end of a pair of terminals (21, 22), and the pair of terminals (21, 22) are formed such that the overall shape of the pair of terminals (21, 22) is circular in a plan view.
(FR) Selon la présente invention, un élément chauffant en céramique (10) comprend : une base en céramique en forme de plaque circulaire (12) dont une surface sert de surface de montage de tranche ; un élément chauffant à résistance de zone centrale (20), ainsi qu'un élément chauffant à résistance de zone circonférentielle externe (50)qui sont incorporés dans la base en céramique en forme de plaque circulaire. L'élément chauffant à résistance de zone centrale (20) possède un câblage disposé de manière à rotation unique, d'une extrémité à l'autre d'une paire de bornes (21, 22), la forme globale de ladite paire de bornes (21,22) étant circulaire dans une vue en plan.
(JA) セラミックヒータ(10)は、片面がウエハ載置面である円板状のセラミック基体(12)に中央ゾーン抵抗発熱体(20)及び外周ゾーン抵抗発熱体(50)が埋設されている。中央ゾーン抵抗発熱体(20)は、一対の端子(21,22)の一方から他方まで一筆書きの要領で配線されており、一対の端子(21,22)は、平面視したときに一対の端子(21,22)の全体形状が円形になるように形成されている。
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)