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1. (WO2018159364) LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD FOR MANUFACTURING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD
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Pub. No.: WO/2018/159364 International Application No.: PCT/JP2018/005792
Publication Date: 07.09.2018 International Filing Date: 19.02.2018
IPC:
B41N 1/14 (2006.01) ,G03F 7/00 (2006.01) ,G03F 7/004 (2006.01) ,G03F 7/027 (2006.01) ,G03F 7/033 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
41
PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
N
PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE OR CONSERVING THEM
1
Printing plates or foils; Materials therefor
12
non-metallic other than stone
14
Lithographic printing foils
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
032
with binders
033
the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors:
園川 浩二 SONOKAWA, Koji; JP
Agent:
特許業務法人太陽国際特許事務所 TAIYO, NAKAJIMA & KATO; 東京都新宿区新宿4丁目3番17号 3-17, Shinjuku 4-chome, Shinjuku-ku, Tokyo 1600022, JP
Priority Data:
2017-03721628.02.2017JP
Title (EN) LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD FOR MANUFACTURING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD
(FR) PLAQUE ORIGINALE POUR PLAQUE D’IMPRESSION LITHOGRAPHIQUE, PROCÉDÉ DE FABRICATION DE PLAQUE D’IMPRESSION LITHOGRAPHIQUE, ET PROCÉDÉ D’IMPRESSION LITHOGRAPHIQUE
(JA) 平版印刷版原版、平版印刷版の製版方法、及び、平版印刷方法
Abstract:
(EN) Provided are: a lithographic printing plate precursor having an image-forming layer on a support, the image-forming layer containing an infrared absorbing agent, a polymerization initiator, a polymerizable compound, and polymer particles having an active hydrogen group; a method for manufacturing a lithographic printing plate using the lithographic printing plate precursor; and a lithographic printing method using the lithographic printing plate. A: The polymerizable compound includes a polymerizable compound containing at least one blocked isocyanate group. B: The image-forming layer further includes a crosslinking agent containing at least two blocked isocyanate groups.
(FR) L’invention concerne une plaque originale pour plaque d’impression lithographique qui possède une couche de formation d’image contenant sur un support, un agent d’absorption des rayons infrarouges, un initiateur de polymérisation, un composé polymérisable, et des particules polymère possédant un groupe hydrogène actif, et qui satisfait la condition (A) et/ou la condition (B). L’invention concerne également un procédé de fabrication de plaque d’impression lithographique mettant en œuvre cette plaque originale pour plaque d’impression lithographique, et un procédé d’impression lithographique mettant en œuvre ce procédé de fabrication de plaque d’impression lithographique. (A) : Ledit composé polymérisable inclut un composé polymérisable comprenant au moins un groupe isocyanate séquencé. (B) : Ladite couche de formation d’image contient également un agent de réticulation comprenant au moins deux groupes isocyanate séquencé.
(JA) 支持体上に、赤外線吸収剤、重合開始剤、重合性化合物、及び活性水素基を有するポリマー粒子、を含む画像形成層を有し、下記A及びBの少なくとも一方を満たす 平版印刷版原版、これを用いた平版印刷版の製版方法、及び、これを用いた平版印刷方法。 A:上記重合性化合物が、ブロック化イソシアネート基を少なくとも1つ含有する重合性化合物を含む。 B:上記画像形成層が、ブロック化イソシアネート基を少なくとも2つ含有する架橋剤、を更に含む。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)