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1. (WO2018159087) METHOD FOR CREATING PLANOGRAPHIC PRINTING PLATE
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Pub. No.: WO/2018/159087 International Application No.: PCT/JP2017/046783
Publication Date: 07.09.2018 International Filing Date: 26.12.2017
IPC:
G03F 7/32 (2006.01) ,G03F 7/00 (2006.01) ,G03F 7/004 (2006.01) ,G03F 7/027 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26
Processing photosensitive materials; Apparatus therefor
30
Imagewise removal using liquid means
32
Liquid compositions therefor, e.g. developers
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors:
割石 幸司 WARIISHI, Koji; JP
會津 康平 AIZU, Kohei; JP
Agent:
特許業務法人太陽国際特許事務所 TAIYO, NAKAJIMA & KATO; 東京都新宿区新宿4丁目3番17号 3-17, Shinjuku 4-chome, Shinjuku-ku, Tokyo 1600022, JP
Priority Data:
2017-03721728.02.2017JP
Title (EN) METHOD FOR CREATING PLANOGRAPHIC PRINTING PLATE
(FR) PROCÉDÉ DE CRÉATION D'UNE PLAQUE D'IMPRESSION PLANOGRAPHIQUE
(JA) 平版印刷版の作製方法
Abstract:
(EN) Provided is a method for creating a planographic printing plate, the method comprising, in this sequence, a step for preparing a planographic printing original plate having an image recording layer on a hydrophilic support, a step for exposing the planographic printing original plate in an image-like manner, and a step for, by using a developing liquid, removing an unexposed part of the image recording layer exposed in the planographic printing original plate, wherein: the developing liquid contains a compound having at least one carboxy group and at least one acid group selected from the group consisting of phosphate group, phosphonate group, and phosphinate group; the developing liquid has a pH of 5-10; and said method does not comprise, after the removing step, a step for washing the surface of the resultant planographic printing plate with water or a step for applying a desensitizing treatment to the surface of the resultant planographic printing plate.
(FR) La présente invention foncerne un procédé de création d'une plaque d'impression planographique, le procédé comprenant, dans cette séquence, une étape consistant à préparer une plaque originale d'impression planographique ayant une couche d'enregistrement d'image sur un support hydrophile, une étape consistant à exposer la plaque originale d'impression planographique d'une manière semblable à une image, et une étape consistant, à l'aide d'un liquide de développement, à retirer une partie non exposée de la couche d'enregistrement d'image exposée dans la plaque originale d'impression planographique. Le liquide de développement contient un composé ayant au moins un groupe carboxy et au moins un groupe acide choisi dans le groupe constitué par un groupe phosphate, un groupe phosphonate et un groupe phosphinate ; le liquide de développement présente un pH compris entre 5 et 10 ; et ledit procédé ne comprend pas, après l'étape d'élimination, d'étape de lavage de la surface de la plaque d'impression planographique résultante avec de l'eau ou d'étape d'application d'un traitement de désensibilisation sur la surface de la plaque d'impression planographique résultante.
(JA) 平版印刷版の作製方法は、親水性支持体上に画像記録層を有する平版印刷版原版を準備する工程、上記平版印刷版原版を画像様に露光する工程、及び、上記平版印刷版原版における露光された上記画像記録層の未露光部を現像液を用いて除去する工程をこの順で含み、上記現像液が、リン酸基、ホスホン酸基及びホスフィン酸基よりなる群から選ばれる少なくとも1つ以上の酸基と、1つ以上のカルボキシ基とを有する化合物を含み、上記現像液のpHが、5~10であり、上記除去する工程後に、得られた平版印刷版の表面を水洗する工程、及び、得られた平版印刷版の表面を不感脂化処理する工程を含まない。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)