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1. (WO2018158804) DAMPING STAND
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Pub. No.: WO/2018/158804 International Application No.: PCT/JP2017/007695
Publication Date: 07.09.2018 International Filing Date: 28.02.2017
IPC:
F16F 15/03 (2006.01) ,F16F 6/00 (2006.01) ,F16F 15/02 (2006.01) ,G12B 9/08 (2006.01)
F MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
16
ENGINEERING ELEMENTS OR UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
F
SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
15
Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
02
Suppression of vibrations of non-rotating, e.g. reciprocating, systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating system
03
using electromagnetic means
F MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
16
ENGINEERING ELEMENTS OR UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
F
SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
6
Magnetic springs; Fluid magnetic springs
F MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
16
ENGINEERING ELEMENTS OR UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
F
SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
15
Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
02
Suppression of vibrations of non-rotating, e.g. reciprocating, systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating system
G PHYSICS
12
INSTRUMENT DETAILS
B
CONSTRUCTIONAL DETAILS OF INSTRUMENTS, OR COMPARABLE DETAILS OF OTHER APPARATUS, NOT OTHERWISE PROVIDED FOR
9
Housing or supporting of instruments or other apparatus
08
Supports; Devices for carrying
Applicants:
株式会社トライテック TRYTEC CO., LTD. [JP/JP]; 大分県大分市青崎一丁目3番42号 3-42, Aozaki 1-chome, Oita-shi, Oita 8700278, JP
Inventors:
竹▲崎▼ 博 TAKEZAKI Hiroshi; JP
Agent:
加島 広基 KASHIMA Hiromoto; JP
高村 雅晴 TAKAMURA Masaharu; JP
Priority Data:
Title (EN) DAMPING STAND
(FR) SUPPORT D'AMORTISSEMENT
(JA) 制振台
Abstract:
(EN) A damping stand (1) comprises: a base part (10) provided with a float magnet (18); and a placement part (20) that is provided with a floated magnet (28) and that includes a placement surface (20a) on which a placement object is placed. The float magnet (18) and the floated magnet (28) each include a magnetic-pole surface, and the surfaces have mutually identical magnetism and are disposed so as to be inclined with respect to the placement surface (20a) and so as to face each other. The placement part (20) floats above the base part (10) by using a magnetic repulsive force acting between the float magnet (18) and the floated magnet (28).
(FR) La présente invention concerne un support d'amortissement (1) comprenant : une partie base (10) pourvue d'un aimant flotteur (18) ; et une partie de placement (20) qui est pourvue d'un aimant flottant (28) et qui comprend une surface de placement (20a) sur laquelle un objet de placement est placé. L'aimant flotteur (18) et l'aimant flottant (28) comprennent chacun une surface de pôle magnétique, et les surfaces ont un magnétisme mutuellement identique et sont disposées de façon à être inclinées par rapport à la surface de placement (20a) et de façon à se faire face. La partie de placement (20) flotte au-dessus de la partie base (10) en utilisant une force de répulsion magnétique agissant entre l'aimant flotteur (18) et l'aimant flottant (28).
(JA) 制振台(1)は、浮揚用磁石(18)が設けられたベース部(10)と、被浮揚用磁石(28)が設けられ、載置物が載置される載置面(20a)を有する載置部(20)と、を備え、浮揚用磁石(18)および被浮揚用磁石(28)の同一の磁性の磁極面は、載置面(20a)に対してそれぞれ傾斜するとともに対向するよう設けられている。載置部(20)は、浮揚用磁石(18)および被浮揚用磁石(28)の間に作用する磁気反発力によりベース部(10)から浮揚するようになっている。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)