Search International and National Patent Collections

1. (WO2018158263) METHOD FOR THE SELF-ADJUSTED EXPOSURE OF SIDE SURFACES OF A SEMICONDUCTOR BODY

Pub. No.:    WO/2018/158263    International Application No.:    PCT/EP2018/054834
Publication Date: Sat Sep 08 01:59:59 CEST 2018 International Filing Date: Wed Feb 28 00:59:59 CET 2018
IPC: H01L 33/00
H01L 33/20
H01L 33/38
H01L 33/44
Applicants: OSRAM OPTO SEMICONDUCTORS GMBH
Inventors: EBBECKE, Jens
TAEGER, Sebastian
Title: METHOD FOR THE SELF-ADJUSTED EXPOSURE OF SIDE SURFACES OF A SEMICONDUCTOR BODY
Abstract:
The invention relates to a method for exposing side surfaces (31) of a semiconductor body (2), in which method the semiconductor body (2) comprising a first main surface (201) that extends laterally is provided. A plurality of vertical side surfaces (31) is formed by partially ablating material of the semiconductor body (2) and the first main surface (201) being removed thereby in regions, wherein the side surfaces (31) each form an angle (α) of between 110° and 160° inclusive with the remaining first main surface (201). A protective layer (4) is applied to the semiconductor body (2) such that the protective layer (4) as viewed from above completely covers the remaining first main surface (201) and the obliquely formed side surfaces (31). The protective layer (4) is then removed in regions, wherein the protective layer (4), during a joint method step because of the inclination, is removed in regions on the obliquely formed side faces (31) and is preserved in regions on the remaining first main surface (201) at least in part.