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1. (WO2018158129) LASING-GAS MIXTURE FOR EXCIMER LASER
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Pub. No.: WO/2018/158129 International Application No.: PCT/EP2018/054370
Publication Date: 07.09.2018 International Filing Date: 22.02.2018
IPC:
H01S 3/225 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
S
DEVICES USING STIMULATED EMISSION
3
Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves
14
characterised by the material used as the active medium
22
Gases
223
the active gas being polyatomic, i.e. containing more than one atom
225
comprising an excimer or exciplex
Applicants:
COHERENT LASERSYSTEMS GMBH & CO. KG [DE/DE]; Hans-Böckler-Strasse 12 37079 Göttingen, DE
Inventors:
BRAGIN, Igor; DE
MELNIKOV, Oleg; DE
MISYURYAEV, Timur; US
Agent:
REDDIE & GROSE LLP; Robert SACKIN The White Chapel Building 10 Whitechapel High Street London Greater London E1 8QS, GB
Priority Data:
15/448,02302.03.2017US
Title (EN) LASING-GAS MIXTURE FOR EXCIMER LASER
(FR) MÉLANGE DE GAZ-ÉMETTEUR DE LASER POUR LASER EXCIMÈRE
Abstract:
(EN) A xenon chloride (XeC1) excimer laser (12) includes a lasing-gas mixture including a buffer gas, a noble gas, a halogen-donating gas, and deuterium. The deuterium is present in a concentration greater than about 10 parts-per-million.
(FR) Un laser excimère (12) au chlorure de xénon (XeC1) comprend un mélange de gaz-émetteur de laser comprenant un gaz tampon, un gaz noble, un gaz donneur d'halogène et du deutérium. Le deutérium est présent dans une concentration supérieure à environ 10 parties par million.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)