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1. (WO2018158101) SPUTTER TARGET AND METHOD FOR PRODUCING A SPUTTER TARGET

Pub. No.:    WO/2018/158101    International Application No.:    PCT/EP2018/054041
Publication Date: Sat Sep 08 01:59:59 CEST 2018 International Filing Date: Tue Feb 20 00:59:59 CET 2018
IPC: C23C 14/06
C23C 14/34
C22C 32/00
Applicants: PLANSEE COMPOSITE MATERIALS GMBH
Inventors: POLCIK, Peter
KOLOZSVARI, Szilard
MAYRHOFER, Paul
RIEDL, Helmut
Title: SPUTTER TARGET AND METHOD FOR PRODUCING A SPUTTER TARGET
Abstract:
The invention relates to a target for using in a physical vapour deposition process, with a matrix consisting of a composite material selected from the group consisting of an aluminium-based material, a titanium-based material and a chromium-based material, and any combinations thereof, the matrix being doped with doping elements and the doping elements being embedded in the matrix as constituents of ceramic compounds or aluminium alloys, the doping elements being selected from the group of lanthanoids: La, Ce, Nb, Sm and Eu. The invention also relates to a method for producing such a target and to the use of such a target in a physical vapour deposition process.