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1. (WO2018146904) VAPOR DEPOSITION MASK, VAPOR DEPOSITION MASK PRODUCTION METHOD, AND VAPOR DEPOSITION MASK PRODUCTION DEVICE
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Pub. No.: WO/2018/146904 International Application No.: PCT/JP2017/041960
Publication Date: 16.08.2018 International Filing Date: 22.11.2017
IPC:
C23C 14/04 (2006.01) ,H01L 51/50 (2006.01) ,H05B 33/10 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
04
Coating on selected surface areas, e.g. using masks
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50
specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
B
ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
33
Electroluminescent light sources
10
Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
Applicants:
株式会社ジャパンディスプレイ JAPAN DISPLAY INC. [JP/JP]; 東京都港区西新橋三丁目7番1号 3-7-1, Nishi-shinbashi, Minato-ku, Tokyo 1050003, JP
Inventors:
成谷 元嗣 NARIYA, Mototsugu; JP
Agent:
特許業務法人はるか国際特許事務所 HARUKA PATENT & TRADEMARK ATTORNEYS; 東京都千代田区六番町3 六番町SKビル5階 Rokubancho SK Bldg. 5th Floor, 3, Rokubancho, Chiyoda-ku, Tokyo 1020085, JP
Priority Data:
2017-02287410.02.2017JP
Title (EN) VAPOR DEPOSITION MASK, VAPOR DEPOSITION MASK PRODUCTION METHOD, AND VAPOR DEPOSITION MASK PRODUCTION DEVICE
(FR) MASQUE DE DÉPÔT EN PHASE VAPEUR, PROCÉDÉ DE PRODUCTION D'UN MASQUE DE DÉPÔT EN PHASE VAPEUR, ET DISPOSITIF DE PRODUCTION D'UN MASQUE DE DÉPÔT EN PHASE VAPEUR
(JA) 蒸着マスク、蒸着マスクの製造方法および蒸着マスクの製造装置
Abstract:
(EN) In order to achieve sufficient joining strength between a mask and a frame, a vapor deposition mask is equipped with: a mask body having a pattern section in which pattern openings are formed, and a frame section which surrounds the pattern section; and a mask frame which supports the frame section. Therein, the frame section has an end surface which intersects the mask frame, and the mask body is secured to the mask frame at the end surface.
(FR) Afin de produire une force d'assemblage suffisante entre un masque et un cadre, l'invention concerne un masque de dépôt en phase vapeur comprenant : un corps de masque présentant une section de motif dans laquelle des ouvertures de motif sont formées, et une section de cadre qui entoure la section de motif ; et un cadre de masque qui soutient la section de cadre. La section de cadre présente une surface d'extrémité qui coupe le cadre de masque, et le corps de masque est fixé au cadre de masque au niveau de la surface d'extrémité.
(JA) マスクとフレームとの十分な接合強度を実現する。 蒸着マスクであって、パターン開口が形成されたパターン部および前記パターン部を囲む枠部を有するマスク本体と、前記枠部を支持するマスクフレームとを備え、前記枠部は、前記マスクフレームと交差する端面を有し、前記マスク本体は、前記端面で前記マスクフレームに固定されている。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)