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1. (WO2018146901) HIGH FREQUENCY MEASUREMENT METHOD AND HIGH FREQUENCY MEASUREMENT DEVICE
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Pub. No.: WO/2018/146901 International Application No.: PCT/JP2017/041675
Publication Date: 16.08.2018 International Filing Date: 20.11.2017
IPC:
G01R 31/26 (2014.01) ,G01R 31/316 (2006.01) ,H03F 3/189 (2006.01)
G PHYSICS
01
MEASURING; TESTING
R
MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
31
Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
26
Testing of individual semiconductor devices
G PHYSICS
01
MEASURING; TESTING
R
MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
31
Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
28
Testing of electronic circuits, e.g. by signal tracer
316
Testing of analog circuits
H ELECTRICITY
03
BASIC ELECTRONIC CIRCUITRY
F
AMPLIFIERS
3
Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
189
High-frequency amplifiers, e.g. radio frequency amplifiers
Applicants: NEC CORPORATION[JP/JP]; 7-1, Shiba 5-chome, Minato-ku, Tokyo 1088001, JP
Inventors: MURAO Yoji; JP
Agent: IEIRI Takeshi; JP
Priority Data:
2017-02115508.02.2017JP
Title (EN) HIGH FREQUENCY MEASUREMENT METHOD AND HIGH FREQUENCY MEASUREMENT DEVICE
(FR) PROCÉDÉ ET DISPOSITIF DE MESURE À HAUTE FRÉQUENCE
(JA) 高周波測定方法及び高周波測定装置
Abstract:
(EN) Conventional high frequency measurement methods have a problem in which variation in high frequency performance when a high frequency signal is applied to an amplifier cannot be accurately ascertained. In one aspect of a high frequency measurement method according to the present invention, a test signal (TS) is generated that is a sine wave signal having a prescribed frequency and in which a period (τ) in which the power level is a first power level and a period (T - τ) in which the power level is a second power level lower than the first power level are periodically repeated, the test signal (TS) is applied to an object of measurement (10) as an input signal, and the difference between the output signal (OUT) of the object of measurement (10) and the ideal value of the output signal (OUT) is measured.
(FR) Les procédés classiques de mesure à haute fréquence présentent le problème qu'une variation de performance à haute fréquence ne peut pas être déterminée avec précision quand un signal à haute fréquence est appliqué à un amplificateur. Selon un aspect, la présente invention concerne un procédé de mesure à haute fréquence, où un signal de test (TS) qui est un signal d'onde sinusoïdale de fréquence prescrite est généré, dans lequel une période (τ) où le niveau de puissance est un premier niveau de puissance et une période (T - τ) où le niveau de puissance est un second niveau de puissance inférieur au premier sont périodiquement répétés, et appliqué à l'objet de la mesure (10) à titre de signal d'entrée, et la différence entre le signal de sortie (OUT) de l'objet de la mesure (10) et la valeur idéale du signal de sortie (OUT) est mesurée.
(JA) 従来の高周波測定方法では、増幅器に高周波信号を入力した際の高周波性能の変動を正確に把握することができない問題がある。本発明にかかる高周波測定方法の一態様は、所定の周波数を有する正弦波信号であって、電力レベルが第1の電力レベルとなる期間(τ)と第1の電力レベルよりも低い第2の電力レベルとなる期間(T-τ)が周期的に繰り返される試験信号(TS)を生成し、試験信号(TS)を入力信号として被測定物(10)に入力し、被測定物(10)の出力信号(OUT)と、出力信号(OUT)の理想値との差分を測定する。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)