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1. (WO2018146869) DEPOSITION MASK
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Pub. No.: WO/2018/146869 International Application No.: PCT/JP2017/039056
Publication Date: 16.08.2018 International Filing Date: 30.10.2017
IPC:
C23C 14/04 (2006.01) ,H01L 51/50 (2006.01) ,H05B 33/10 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
04
Coating on selected surface areas, e.g. using masks
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50
specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
B
ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
33
Electroluminescent light sources
10
Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
Applicants:
株式会社ジャパンディスプレイ JAPAN DISPLAY INC. [JP/JP]; 東京都港区西新橋三丁目7番1号 3-7-1, Nishi-shinbashi, Minato-ku, Tokyo 1050003, JP
Inventors:
小野 敬亮 ONO, Keisuke; JP
武田 篤 TAKEDA, Atsushi; JP
山田 哲行 YAMADA, Tetsuyuki; JP
成谷 元嗣 NARIYA, Mototsugu; JP
為川 貢 TAMEKAWA, Mitsugu; JP
大河原 健 OOKAWARA, Takeshi; JP
平坂 直人 HIRASAKA, Naoto; JP
渡辺 大樹 WATANABE, Taiki; JP
Agent:
特許業務法人はるか国際特許事務所 HARUKA PATENT & TRADEMARK ATTORNEYS; 東京都千代田区六番町3 六番町SKビル5階 Rokubancho SK Bldg. 5th Floor, 3, Rokubancho, Chiyoda-ku, Tokyo 1020085, JP
Priority Data:
2017-02287510.02.2017JP
Title (EN) DEPOSITION MASK
(FR) MASQUE DE DÉPÔT
(JA) 蒸着マスク
Abstract:
(EN) The purpose of the present invention is to achieve high-precision pattern deposition in film formation using a mask. Provided is a vapor deposition mask comprising: a mask body having a pattern section in which pattern openings are formed, and a border section surrounding the pattern section; a mask frame for supporting the border section of the mask body; and an intermediate member having a shape corresponding to the mask frame and disposed between the mask body and the mask frame. The mask body and a first surface of the intermediate member are joined together, and the mask frame and a surface of the intermediate member on the side opposite the first surface thereof are joined together.
(FR) La présente invention a pour objet d'obtenir un dépôt de motif de haute précision lors de la formation de films au moyen d'un masque. Plus précisément, l'invention concerne un masque de dépôt en phase vapeur comprenant : un corps de masque ayant une section de motif dans laquelle des ouvertures de motif sont formées, et une section de bordure entourant la section de motif ; un cadre de masque pour supporter la section de bordure du corps de masque ; et un élément intermédiaire ayant une forme correspondant au cadre de masque et disposé entre le corps de masque et le cadre de masque. Le corps de masque et une première surface de l'élément intermédiaire sont reliés l'un à l'autre, et le cadre de masque et une surface de l'élément intermédiaire sur le côté opposé à la première surface de celui-ci sont reliés l'un à l'autre.
(JA) マスクを用いた成膜において、高精度なパターン成膜を実現する。 蒸着マスクであって、パターン開口が形成されたパターン部および該パターン部を囲む枠部を有するマスク本体と、前記マスク本体の枠部を支持するマスクフレームと、前記マスクフレームに対応する形状を有し、前記マスク本体と前記マスクフレームとの間に配置される中間部材と、を備え、前記マスク本体と前記中間部材の第1の面とが接合され、前記マスクフレームと前記中間部材の前記第1の面とは反対側の面とが接合されている。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)