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Pub. No.: WO/2018/145866 International Application No.: PCT/EP2018/051061
Publication Date: 16.08.2018 International Filing Date: 17.01.2018
IPC:
G03F 7/20 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants: ASML HOLDING N.V.[NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
Inventors: ZORDAN, Enrico; US
EVANS, Brandon, Adam; US
BURBANK, Daniel, Nathan; US
BAHETI, Ankur, Ramesh; US
NAYFEH, Samir A.; US
Agent: SLENDERS, Petrus; NL
Priority Data:
62/457,26910.02.2017US
Title (EN) RETICLE CLAMPING DEVICE
(FR) DISPOSITIF DE SERRAGE DE RÉTICULE
Abstract:
(EN) Systems and methods are disclosed that provide a support system in the Z direction for patterning devices that can function under high acceleration and deceleration with minimal effect on travel and hysteresis in the X and Y directions. A reticle clamping system includes a support device and a holding device. The holding device is configured to releasably couple a reticle to the support device. The holding device includes a plurality of burls. The reticle clamping system further includes a metallic support system coupled to the support device. The metallic support system provides a vacuum path from a vacuum channel to the holding device.
(FR) L'invention concerne des systèmes et des procédés qui mettent en œuvre un système de support dans la direction Z pour des dispositifs de formation de motifs qui peuvent fonctionner sous une accélération et une décélération élevées avec un effet minimal sur le déplacement et l'hystérésis dans les directions X et Y. Un système de serrage de réticule comprend un dispositif de support et un dispositif de retenue. Le dispositif de retenue est configuré pour coupler de manière amovible un réticule au dispositif de support. Le dispositif de retenue comprend une pluralité de nœuds. Le système de serrage de réticule comprend en outre un système de support métallique couplé au dispositif de support. Le système de support métallique fournit un trajet de vide allant d'un canal à vide jusqu'au dispositif de retenue.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)