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1. (WO2018145849) LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Pub. No.:    WO/2018/145849    International Application No.:    PCT/EP2018/050640
Publication Date: Fri Aug 17 01:59:59 CEST 2018 International Filing Date: Fri Jan 12 00:59:59 CET 2018
IPC: G03F 7/20
Applicants: ASML NETHERLANDS B.V.
Inventors: BUTLER, Hans
VERVOORDELDONK, Michael, Johannes
WIJCKMANS, Maurice, Willem, Jozef, Etiënne
Title: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
Abstract:
A lithographic apparatus is described, the apparatus comprising: a projection system (PS; 200) configured to project a patterned beam (B) of radiation onto a substrate (W); the projection system comprising a plurality of optical elements (200.1, 200.2); a sensor frame (220); a first position measurement system (240) configured to measure a position of the plurality of optical elements relative to the sensor frame; wherein the sensor frame comprises: - N sub-frames (220.1, 220.2), N being an integer > 1, - a coupling system (220.3) coupling the N sub-frames and - a second position measurement system (250) configured to determine a relative position of the N sub-frames.