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1. (WO2018143355) ANALYSIS DEVICE
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Pub. No.: WO/2018/143355 International Application No.: PCT/JP2018/003437
Publication Date: 09.08.2018 International Filing Date: 01.02.2018
IPC:
G01N 21/67 (2006.01) ,G01N 21/68 (2006.01) ,H05H 1/24 (2006.01)
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21
Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible, or ultra-violet light
62
Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
66
electrically excited, e.g. electroluminescence
67
using electric arcs or discharges
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21
Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible, or ultra-violet light
62
Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
66
electrically excited, e.g. electroluminescence
68
using high frequency electric fields
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
H
PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
1
Generating plasma; Handling plasma
24
Generating plasma
Applicants:
イマジニアリング株式会社 IMAGINEERING, INC. [JP/JP]; 兵庫県神戸市中央区港島南町7丁目4番4 7-4-4, Minatojimaminami-machi, Chuo-ku, Kobe-shi, Hyogo 6500047, JP
Inventors:
池田 裕二 IKEDA Yuji; JP
Priority Data:
2017-01715301.02.2017JP
Title (EN) ANALYSIS DEVICE
(FR) DISPOSITIF D'ANALYSE
(JA) 分析装置
Abstract:
(EN) This analysis device is provided with a plasma generator 3 which brings part of an analyte to a plasma state, and an optical analyzer 2 which analyzes the plasma light of the analyte emitted from the plasma generated by the plasma generator 3, wherein, by means of a conveyance device 4, the analyte contacts the plasma PB generated by the plasma generator 3 in order, and the analyte is conveyed such that a portion thereof is brought to a plasma state. The plasma generator 3 is provided with an electromagnetic wave irradiator which irradiates electromagnetic waves onto the generated plasma, and the conveyance device 4 forms a plasma contact area S where the bottom or side of the analyte contacts the plasma generated by the plasma generator 3.
(FR) Cette invention concerne un dispositif d'analyse comprenant un générateur de plasma 3 qui amène une partie de l'analyte à l'état de plasma, et un analyseur optique 2 qui analyse la lumière plasma de l'analyte émise à partir du plasma généré par le générateur de plasma 3. Un dispositif de transport 4 permet à l'analyte d'entrer en contact avec le plasma PB généré par le générateur de plasma 3, et l'analyte est transporté de façon qu'une partie de celui-ci soit amenée à l'état de plasma. Le générateur de plasma 3 comprend en outre un générateur d'ondes électromagnétiques qui expose le plasma généré auxdites ondes électromagnétiques, et le dispositif de transport 4 forme une zone de contact plasma S où le fond ou le côté de l'analyte entre en contact avec le plasma généré par le générateur de plasma 3.
(JA) 分析対象物の一部をプラズマ状態にするプラズマ生成器3と、このプラズマ生成器3により生成されたプラズマから発せられる分析対象物のプラズマ光を分析する光分析器2とを備え、分析対象物は搬送機4によって順次プラズマ生成器3によって生成されるプラズマPBに当接し、一部がプラズマ状態となるように搬送される。プラズマ生成器3は、生成したプラズマに電磁波を照射する電磁波照射器を備え、搬送機4は、分析対象物の下部又は側面がプラズマ生成器3によって生成されるプラズマと接触するプラズマ接触部Sを形成する。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)