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1. (WO2018143230) METHOD FOR PRODUCING R-T-B SINTERED MAGNET
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Pub. No.: WO/2018/143230 International Application No.: PCT/JP2018/003089
Publication Date: 09.08.2018 International Filing Date: 31.01.2018
IPC:
H01F 41/02 (2006.01) ,C22C 28/00 (2006.01) ,C22C 38/00 (2006.01) ,H01F 1/057 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
F
MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
41
Apparatus or processes specially adapted for manufacturing or assembling the devices covered by this subclass
02
for manufacturing cores, coils or magnets
C CHEMISTRY; METALLURGY
22
METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
C
ALLOYS
28
Alloys based on a metal not provided for in groups C22C5/-C22C27/103
C CHEMISTRY; METALLURGY
22
METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
C
ALLOYS
38
Ferrous alloys, e.g. steel alloys
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
F
MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
1
Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
01
of inorganic materials
03
characterised by their coercivity
032
of hard-magnetic materials
04
metals or alloys
047
Alloys characterised by their composition
053
containing rare earth metals
055
and magnetic transition metals, e.g. SmCo5
057
and IIIa elements, e.g. Nd2Fe14B
Applicants:
日立金属株式会社 HITACHI METALS, LTD. [JP/JP]; 東京都港区港南一丁目2番70号 2-70, Konan 1-chome, Minato-ku, Tokyo 1088224, JP
Inventors:
國吉 太 KUNIYOSHI Futoshi; --
Agent:
奥田 誠司 OKUDA Seiji; JP
Priority Data:
2017-01539531.01.2017JP
Title (EN) METHOD FOR PRODUCING R-T-B SINTERED MAGNET
(FR) PROCÉDÉ DE PRODUCTION D’AIMANT FRITTÉ R-T-B
(JA) R-T-B系焼結磁石の製造方法
Abstract:
(EN) In this method for producing an R-T-B sintered magnet, an R1-T-B sintered magnet material and an R2-Ga alloy are prepared. The sintered magnet material contains 27.5-35.0 mass% of R, 0.80-0.99 mass% of B, 0-0.8 mass% of Ga, 0-2 mass% of M (M is at least one of Cu, Al, Nb, and Zr), and 60 mass% or more of T. The following are performed in the method: a diffusion step in which at least part of the R2-Ga alloy is brought into contact with at least part of the surface of the sintered magnet material and the amount of RH included in the sintered magnet material is increased by 0.05-0.40 mass% by performing first heat treatment at a temperature of 700-950°C; and second heat treatment performed at a temperature that is in the range of 450-750°C and lower than the temperature of the first heat treatment.
(FR) La présente invention concerne un procédé de production d’un aimant fritté R-T-B, dans lequel un matériau d’aimant fritté R1-T-B et un alliage R2-Ga sont préparés. Le matériau d’aimant fritté contient 27,5 à 35,0 % en masse de R, 0,80 à 0,99 % en masse de B, 0 à 0,8 % en masse de Ga, 0 à 2 % en masse de M (M est au moins l’un parmi Cu, Al, Nb et Zr), et 60 % en masse ou plus de T. Le procédé comprend les étapes suivantes : une étape de diffusion dans laquelle au moins une partie de l’alliage R2-Ga est mise en contact avec au moins une partie de la surface du matériau d’aimant fritté et la quantité de RH incluse dans le matériau d’aimant fritté est augmentée de 0,05 à 0,40 % en masse en effectuant un premier traitement thermique à une température de 700 à 950 °C ; et un deuxième traitement thermique effectué à une température qui est dans la plage de 450 à 750 °C et inférieure à la température du premier traitement thermique.
(JA) R1-T-B系焼結磁石素材、R2-Ga合金を準備する。焼結磁石素材は、R:27.5~35.0質量%、B:0.80~0.99質量%、Ga:0~0.8質量%、M:0~2質量%(MはCu、Al、Nb、Zrの少なくとも一種)、T:60質量%以上を含有する。焼結磁石素材表面の少なくとも一部にR2-Ga合金の少なくとも一部を接触させ、700℃以上950℃以下の温度で第一の熱処理を実施することで焼結磁石素材に含有されるRH量を0.05質量%以上0.40質量%以下増加させる拡散工程と、450℃以上750℃以下の温度で、かつ前記第一の熱処理温度よりも低い温度で第二の熱処理を実施する。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)