WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Options
Query Language
Stem
Sort by:
List Length
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2018/142933 International Application No.: PCT/JP2018/001180
Publication Date: 09.08.2018 International Filing Date: 17.01.2018
IPC:
C08J 5/18 (2006.01) ,H01G 4/18 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
J
WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H142
5
Manufacture of articles or shaped materials containing macromolecular substances
18
Manufacture of films or sheets
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
G
CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
4
Fixed capacitors; Processes of their manufacture
002
Details
018
Dielectrics
06
Solid dielectrics
14
Organic dielectrics
18
of synthetic material, e.g. derivatives of cellulose
Applicants: DAIKIN INDUSTRIES, LTD.[JP/JP]; Umeda Center Building, 4-12, Nakazaki-Nishi 2-Chome, Kita-ku, Osaka-Shi, Osaka 5308323, JP
Inventors: YOKOTANI, Kouji; JP
KOMATSU, Nobuyuki; JP
HAZAMA, Takeshi; JP
TATEMICHI, Mayuko; JP
HIGAKI, Akio; JP
HIGUCHI, Tatsuya; JP
YAMAZAKI, Keiko; JP
Agent: YASUTOMI & ASSOCIATES; 5-36, Miyahara 3-chome, Yodogawa-ku, Osaka-shi, Osaka 5320003, JP
Priority Data:
2017-01603331.01.2017JP
Title (EN) FLUORORESIN FILM
(FR) FILM DE RÉSINE FLUORÉE
(JA) フッ素樹脂フィルム
Abstract:
(EN) Provided is a fluororesin film that has a low coefficient of static friction and a high dielectric breakdown strength. The fluororesin film contains a fluororesin and is characterized by at least one surface thereof having a 10-point mean roughness of 0.100-1.200 μm and an arithmetic mean roughness of 0.010-0.050 μm and by a dielectric breakdown strength of at least 400 V/μm.
(FR) L'invention fournit un film de résine fluorée qui présente un faible coefficient de frottement statique et une résistance au claquage élevée. Plus précisément, l'invention concerne un film de résine fluorée qui contient une résine fluorée, et qui est caractéristique en ce qu'elle présente une rugosité moyenne en dix points d'au moins une surface comprise entre 0,100 et 1,200μm, une rugosité moyenne arithmétique comprise entre 0,010 et 0,050μm, et une résistance au claquage supérieure ou égale à 400 V/μm.
(JA) 低い静摩擦係数及び高い絶縁破壊強さを有するフッ素樹脂フィルムを提供する。フッ素樹脂を含むフッ素樹脂フィルムであって、少なくとも一方の表面の10点平均粗さが0.100~1.200μm、かつ、算術平均粗さが0.010~0.050μmであり、絶縁破壊強さが400V/μm以上であることを特徴とするフッ素樹脂フィルムである。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)