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1. (WO2018142871) ACCURACY MANAGEMENT METHOD, ACCURACY MANAGEMENT SYSTEM, MANAGEMENT DEVICE, ANALYSIS DEVICE, AND METHOD FOR DETERMINING ABNORMALITY IN ACCURACY MANAGEMENT

Pub. No.:    WO/2018/142871    International Application No.:    PCT/JP2018/000485
Publication Date: Fri Aug 10 01:59:59 CEST 2018 International Filing Date: Fri Jan 12 00:59:59 CET 2018
IPC: G01N 35/00
G01N 15/14
Applicants: SYSMEX CORPORATION
シスメックス株式会社
Inventors: FUJIMOTO Keiji
藤本 敬二
MATSUOKA Kazuhiko
松岡 和彦
HASUI Yasushi
蓮井 康嗣
Title: ACCURACY MANAGEMENT METHOD, ACCURACY MANAGEMENT SYSTEM, MANAGEMENT DEVICE, ANALYSIS DEVICE, AND METHOD FOR DETERMINING ABNORMALITY IN ACCURACY MANAGEMENT
Abstract:
Provided are an accuracy management method, an accuracy management system, a management device, an analysis device, and a method for determining an abnormality in accuracy management, whereby the quality of accuracy management can be increased by adequately utilizing measurement results for both an accuracy management material and a sample. An accuracy management method used by a management device 30 connected via a network 13 to analysis devices 20 installed in each of a plurality of facilities 12, wherein first accuracy management information obtained by measurement of an artificially generated accuracy management material by the analysis device 20 of each facility 12 and second accuracy management information obtained by measurement of a plurality of samples are acquired via the network 13 from the analysis device 20 of each facility 12, and information relating to accuracy management of the analysis device 20 of at least one facility 12 is outputted on the basis of the acquired first accuracy management information and the second accuracy management information.