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1. (WO2018142179) APPARATUS FOR APPLYING A DEPOSITION ONTO A SUBSTRATE BY A DEPOSITION PROCESS AND METHOD FOR CARRYING OUT A DEPOSITION PROCESS BY USE OF SUCH AN APPARATUS

Pub. No.:    WO/2018/142179    International Application No.:    PCT/IB2017/000931
Publication Date: Fri Aug 10 01:59:59 CEST 2018 International Filing Date: Tue Aug 01 01:59:59 CEST 2017
IPC: C23C 16/44
C23C 16/50
H01J 37/32
Applicants: C4E TECHNOLOGY GMBH
Inventors: BRORS, Daniel
Title: APPARATUS FOR APPLYING A DEPOSITION ONTO A SUBSTRATE BY A DEPOSITION PROCESS AND METHOD FOR CARRYING OUT A DEPOSITION PROCESS BY USE OF SUCH AN APPARATUS
Abstract:
The invention relates to an apparatus (1) for applying a deposition onto a substrate (2) by a deposition process, wherein the apparatus (1) comprises a first vacuum chamber (3) which can be evacuated by means of a first evacuation pump (4). To improve the deposition process the invention is characterized in that a second vacuum chamber (5) for receiving the substrate (2) is arranged within the first vacuum chamber (3). Furthermore, the invention relates to a method for carrying out a deposition process for applying a deposition onto a substrate by use of such an apparatus.